journal article·2023-12-26Open access

Controlling Volatility and Nonvolatility of Memristive Devices by Sn Alloying

Elias Passerini, Mila Lewerenz, Miklós Csontos, Nadia Jimenez Olalla, Killian Keller, Jan Aeschlimann, Fangqing Xie, Alexandros Emboras, Xinzhi Zhang, Markus Fischer, Yuriy Fedoryshyn, Mathieu Luisier, Thomas Schimmel, Ueli Koch, Juerg Leuthold

ACS Applied Electronic Materials· Volume 5· Issue 12

Abstract

High Resolution Image Download MS PowerPoint Slide Memristive devices have attracted significant attention due to their downscaling potential, low power operation, and fast switching performance. Their inherent properties make them suitable for emerging applications such as neuromorphic computing, in-memory computing, and reservoir computing. However, the different applications demand either volatile or nonvolatile operation. In this study, we demonstrate how compliance current and specific material choices can be used to control the volatility and nonvolatility of memristive devices. Especially, by mixing different materials in the active electrode, we gain additional design parameters that allow us to tune the devices for different applications. We found that alloying Ag with Sn stabilizes the nonvolatile retention regime in a reproducible manner. Additionally, our alloying approach improves the reliability, endurance, and uniformity of the devices. We attribute these advances to stabilization of the filament inside the switching medium by the inclusion of Sn in the filament structure. These advantageous properties of alloying were found by investigating a choice of six electrode materials (Ag, Cu, AgCu-1, AgCu-2, AgSn-1, AgSn-2) and three switching layers (SiO 2, Al 2 O 3, HfO 2 ).
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Research context

OpenAlex topics: Advanced Memory and Neural Computing · Neural dynamics and brain function · Ferroelectric and Negative Capacitance Devices

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Affiliations

Institute of Electromagnetic Fields (IEF), ETH Zurich, 8092 Zurich, Switzerland

Integrated Systems Laboratory (IIS), ETH Zurich, 8092 Zurich, Switzerland

Institute of Applied Physics (APH), Karlsruhe Institute of Technology, 76131 Karlsruhe, Germany

Funding

Werner Siemens-Stiftung

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