journal article·2021-08-24

Low Temperature Modeling of Ni/β-Ga2O3 Schottky Barrier Diode Interface

Madani Labed, Jun Hui Park, Afak Meftah, Nouredine Sengouga, Jung Yeop Hong, Young-Kyun Jung, You Seung Rim

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Abstract

Schottky barrier diodes (SBD) are usually qualified by their figures of merit. Evolution of these figures of merit with temperature is an indication of the different conduction mechanisms involved in SBD. Figures of merit extraction at different temperatures is therefore of great importance. Thermionic emission conduction modeling of I–V characteristics is usually considered when extracting these figures of merit. However, high-ideality factor values are obtained at low temperatures because of other conduction mechanisms involved. In this work, TCAD simulation is used to model measured Ni/β-Ga2 O3 SBDs at a temperature range of 100–300 K. This modeling separates tunneling current from thermionic emission current; hence, a reasonable ideality factor of 6.04 was obtained from the total current. An ideality factor of about 1.04 was extracted from the thermionic current component only. Evolution with temperature of this combination of tunneling and thermionic emission is examined. It is concluded that, with increasing temperature, tunneling is reduced while thermionic emission is increased; thus, an ideality factor is almost independent of temperature and close to unity is obtained.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Ga2O3 and related materials · ZnO doping and properties · Semiconductor materials and devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Laboratory of Semiconducting and Metallic Materials (LMSM), University of Biskra, Biskra 07000, Algeria

Department of Intelligent Mechatronics Engineering and Convergence Engineering for Intelligent Drone, Sejong University, Seoul 05006, Republic of Korea

Electronic Device Research Team, Research & Development Division, Hyundai Motor Group, Gyeonggi-do 16082, Republic of Korea

Funding

National Research Foundation of Korea · Korea Institute for Advancement of Technology

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