Preparation of BiVO₄ Films and Modulation of Their Photocatalytic Properties by Pulsed Laser Deposition, Magnetron Sputtering, and Atomic Layer Deposition

With the gradual depletion of fossil fuels and increasing environmental pollution, it is particularly important to find and develop materials and technologies for sustainable clean energy and efficient environmental pollution remediation. Photocatalysis, as a green technology that can utilize the widely available solar energy in nature for energy conversion, pollutant degradation, and chemical preparation, has attracted extensive research. Among them, bismuth vanadate (BiVO 4 ) plays an indispensable role in photocatalytic reactions as a photocatalyst with a narrow band gap, low cost, and good chemical stability. Therefore, this paper provides a detailed overview of the working principles, preparation characteristics, and influencing factors of pulsed laser deposition, magnetron sputtering, and atomic layer deposition technologies that can be used to prepare high-quality BiVO 4 films, and the roles of these methods in the regulation of the crystal facet engineering, element doping, heterojunction construction, and surface modification of BiVO 4 films are systematically described. Moreover, the main challenges and countermeasures encountered by these three methods in the preparation and photocatalytic activity release of BiVO 4 films in the future are critically discussed, providing constructive thinking for the efficient, green, and sustainable development and application of BiVO 4 film photocatalysts in the fields of energy development, environmental protection, and chemical manufacturing.