journal article·2019-11-26

Film-Nanostructure-Controlled Inerasable-to-Erasable Switching Transition in ZnO-Based Transparent Memristor Devices: Sputtering-Pressure Dependency

Firman Mangasa Simanjuntak, Takeo Ohno, Seiji Samukawa

ACS Applied Electronic Materials· Volume 1· Issue 11
Publisher page

Abstract

We found that the write-once-read-many-times (WORM, inerasable)-to-rewritable (erasable) transition phenomenon results from the different structures of the filament, which is determined by the grain orientations of the deposited films. The conduction mechanism of this switching transition and its impact on the synaptic behavior in various ZnO nanostructures are also discussed. Furthermore, our WORM devices have a programmable physical damage function that can be exploited for use in security systems against data theft, hacking, and unauthorized use of software/hardware. This work proposes ZnO-based nonvolatile memory for invisible electronic applications and gives valuable insight into the design of WORM and rewritable memories.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Advanced Memory and Neural Computing · Ferroelectric and Negative Capacitance Devices · Neuroscience and Neural Engineering

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Innovative Engineering, Oita University, Oita 870-1192, Japan

Funding

Ministry of Education, Culture, Sports, Science and Technology · Advanced Institute for Materials Research,Tohoku University

References (30)

Show source-provided references
1. 10.1038/3999910.1038/39999 ↗
2. 10.1186/s11671-016-1570-y10.1186/s11671-016-1570-y ↗
3. 10.1002/adma.20090037510.1002/adma.200900375 ↗
4. 10.1016/j.tsf.2013.01.00410.1016/j.tsf.2013.01.004 ↗
5. 10.1063/1.369404510.1063/1.3694045 ↗
6. 10.1109/TNANO.2011.213214210.1109/TNANO.2011.2132142 ↗
7. 10.1007/s10853-013-7541-010.1007/s10853-013-7541-0 ↗
8. 10.1371/journal.pone.016851510.1371/journal.pone.0168515 ↗
9. 10.1002/pssr.20120643110.1002/pssr.201206431 ↗
10. 10.1039/C7CP07887K10.1039/C7CP07887K ↗
11. 10.1109/TED.2016.258927210.1109/TED.2016.2589272 ↗
12. 10.1021/acsaelm.8b0005510.1021/acsaelm.8b00055 ↗
13. 10.1088/1361-6641/aa959810.1088/1361-6641/aa9598 ↗
14. 10.1149/07704.0155ecst10.1149/07704.0155ecst ↗
15. 10.1116/1.58036510.1116/1.580365 ↗
16. 10.1166/mex.2015.120410.1166/mex.2015.1204 ↗
17. 10.1109/ULTSYM.1991.23420410.1109/ULTSYM.1991.234204 ↗
18. 10.1016/j.matlet.2003.09.02810.1016/j.matlet.2003.09.028 ↗
19. 10.1038/nmat305410.1038/nmat3054 ↗
20. 10.1063/1.509299110.1063/1.5092991 ↗
21. 10.1063/1.355292810.1063/1.3552928 ↗
22. 10.1016/j.ssc.2012.06.01610.1016/j.ssc.2012.06.016 ↗
23. 10.1016/j.tsf.2018.03.06510.1016/j.tsf.2018.03.065 ↗
24. 10.1186/s11671-017-2419-810.1186/s11671-017-2419-8 ↗
25. 10.1021/am201215e10.1021/am201215e ↗
26. 10.1063/1.494859810.1063/1.4948598 ↗
27. 10.1149/1.294591210.1149/1.2945912 ↗
28. 10.1088/1361-6528/aa80b410.1088/1361-6528/aa80b4 ↗
29. 10.1186/s11671-018-2743-710.1186/s11671-018-2743-7 ↗
30. 10.1166/jno.2015.173210.1166/jno.2015.1732 ↗