Effect of various deposition parameters on the co-deposition behavior of cobalt antimony in citric-based solution

H. Cheng; H.H. Hng; J. Ma; X.J. Xu

doi:10.1557/jmr.2008.0361

journal article·2008-11

Effect of various deposition parameters on the co-deposition behavior of cobalt antimony in citric-based solution

H. Cheng, H.H. Hng, J. Ma, X.J. Xu

Journal of Materials Research· Volume 23· Issue 11

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Source abstract

Abstract

Direct current (dc) electrodeposition was used to co-deposit cobalt and antimony in citric-based solutions. Growth behavior of Co–Sb alloy thin films was systematically studied under various deposition conditions. Effects of deposition parameters (i.e., deposition potential, cobalt sulfate concentration, and pH value) on the microstructure, chemical, and phase composition of the deposited materials were also studied and are discussed in detail.

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Research context

Metals & alloys Materials processing

OpenAlex topics: Electrodeposition and Electroless Coatings · Chalcogenide Semiconductor Thin Films · Advanced Thermoelectric Materials and Devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

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