journal article·2001-11

Dependence of fracture stress on applied stress rate in a Yb2O3–SiO2-doped hot-pressed silicon nitride ceramic

Shuqi Guo, Naoto Hirosaki, Yoshinobu Yamamoto, Toshiyuki Nishimura, Mamoru Mitomo

Journal of Materials Research· Volume 16· Issue 11
Publisher page

Abstract

High-temperature fracture behavior of a Yb2O3–SiO2–doped hot-pressed silicon nitride (Si3N4) ceramic was investigated in four-point flexure between 1000 and 1500 °C at five crosshead speeds, using the specimens precracked with three indentation loads. Above 1000 °C, a temperature and stressing rate dependence of fracture stress was seen. At 1200 °C the fracture stress of the precracked specimens increased with decreasing stressing rates due to a toughening effect, the absence of slow crack growth (SCG). However, at 1400 and 1500 °C the fracture stress decreased with decreasing stressing rate. In particular, this dependence was stronger at 1500 °C than at 1400 °C. The SCG was observed only in the specimens precracked with indentation loads of 98 and 196 N. This crack extended with increasing test temperature and/or decreasing stressing rate. The dependence of fracture stress on stressing rate was attributed to a SCG behavior at higher temperatures.
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Research context

OpenAlex topics: Advanced ceramic materials synthesis · Metal and Thin Film Mechanics · Ferroelectric and Piezoelectric Materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

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