journal article·2024-09-28

Hydrophobicity and high-temperature mechanical behaviour of hard and optically transparent nanocomposite Al–Si–N thin films

Soni, S. K. Sharma, S. K. Mishra

Journal of Materials Research· Volume 39· Issue 18
Publisher page

Abstract

Nanocomposite Al–Si–N thin films were deposited on SS 304, silicon and quartz substrates through magnetron sputtering. Silicon addition in AlN has transformed the coating structure from a single-phase coating into a nanocomposite structured film. It affected the phase formation and interband electronic transition in the Al–Si–N thin film. XPS study suggests the formation of Al–N, Si–N and composite Al–Si–N phases in the Al–Si–N film. The Urbach energy increases from 535 to 763 meV with addition of Si, for nanocomposite Al–Si–N film. No significant change in hardness and microstructure were observed up to 400 °C. The Al–Si–N film showed good hydrophobicity on both SS 304 and quartz substrates along with high hardness values. Low wettability and high strength make them a potential candidate for protective optical coatings as they are optically transparent too.Graphical abstract
Source: expertdata · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Metal and Thin Film Mechanics · Diamond and Carbon-based Materials Research · Semiconductor materials and devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (63)

Show source-provided references
1. L. Kumar, P. Shrivastava, D. Panda, A. Ghosh, S.N. Alam, in Tribology and characterization of surface coatings. ed. by S. Ahmed, V.N. Dakre (Wiley-Scrivener, Hoboken, 2022), pp.181–21010.1002/9781119818878.ch9 ↗
2. T. Verho, C. Bower, P. Andrew, S. Franssila, O. Ikkala, R.H.A. Ras, Adv. Mater. 23, 673–678 (2011)10.1002/adma.201003129 ↗
3. G. Wu, X. Chen, X. Xie, P. Zhang, S. Ge, W. Chen, X. Zeng, R. Wang, Appl. Sci. 12, 12927 (2022)10.3390/app122412927 ↗
4. X. Wang, L. Cao, Y. Hu, Y. Chen, T. Jin, J. Huang, X. Zhang, S. Lin, Prog. Org. Coat. 179, 107487 (2023)10.1016/j.porgcoat.2023.107487 ↗
5. Y. Liu, X. Tan, X. Li, T. Xiao, L. Jiang, S. Nie, J. Song, X. Chen, Langmuir 38, 12881–12893 (2022)10.1021/acs.langmuir.2c01998 ↗
6. T. Aytug: Atomically Bonded Transparent Superhydrophobic Coatings. Oak Ridge (2015)10.2172/1209210 ↗
7. X. Zhang, F. Shi, J. Niu, Y. Jiang, Z. Wang, J. Mater, Chem. 18, 621–633 (2008)
8. Y. Gao, Y. Huang, S. Feng, G. Gu, F.L. Qing, J. Mater. Sci. 45, 460–466 (2010)10.1007/s10853-009-3962-1 ↗
9. N.E. Farad, I. Raeisi, Z. Yousefipour, R. Mosavin, A.C.S. Appl, Nano Mater. 7, 5698–5728 (2024)
10. B. Grančič, M. Mikula, T. Roch, P. Zeman, L. Satrapinskyy, M. Gregor, T. Plecenik, E. Dobročka, Z. Hájovská, M. Mičušík, A. Šatka, M. Zahoran, A. Plecenik, P. Kúš, Surf. Coatings Technol. 240, 48–54 (2014)10.1016/j.surfcoat.2013.12.011 ↗
11. C.C. Chang, H.W. Chen, J.W. Lee, J.G. Duh, Surf. Coatings Technol. 284, 273–280 (2015)10.1016/j.surfcoat.2015.06.090 ↗
12. I. Endler, M. Höhn, J. Schmidt, S. Scholz, M. Herrmann, M. Knaut, Surf. Coatings Technol. 215, 133–140 (2013)10.1016/j.surfcoat.2012.10.067 ↗
13. P. Mahato, R.J. Singh, S.K. Mishra, Surf. Coatings Technol. 288, 230–240 (2016)10.1016/j.surfcoat.2016.01.039 ↗
14. J. Sharp, I.C. Muller, P. Mandal, A. Abbas, M. Nord, A. Doye, A. Ehiasarian, P. Hovsepian, I. MacLaren, W.M. Rainforth, Surf. Coatings Technol. 377, 124853 (2019)10.1016/j.surfcoat.2019.08.007 ↗
15. A. Pélisson-Schecker, H.J. Hug, J. Patscheider, Surf. Coatings Technol. 257, 114–120 (2014)10.1016/j.surfcoat.2014.08.053 ↗
16. E. Lewin, D. Loch, A. Montagne, A.P. Ehiasarian, J. Patscheider, Surf. Coatings Technol. 232, 680–689 (2013)10.1016/j.surfcoat.2013.06.076 ↗
17. Soni, S. Kumari, S.K. Sharma, S.K. Mishra, J. Mater. Eng. Perform. 27, 6729–6736 (2018)10.1007/s11665-018-3730-y ↗
18. Soni, S.K. Mishra, S.K. Sharma, Thin Solid Films 682, 1–9 (2019)10.1016/j.tsf.2019.05.006 ↗
19. Soni, S.K. Sharma, S.K. Mishra, J. Alloys Compd. 31, 154686 (2020)10.1016/j.jallcom.2020.154686 ↗
20. M. Shur, Wide band gap semiconductor technology: state-of-the-art. Solid State Electron. 155, 65–75 (2019)10.1016/j.sse.2019.03.020 ↗
21. A. Yoshikawa, H. Matsunami, Y. Nanishi, Wide Bandgap Semiconductors (Springer, Berlin, Heidelberg, 2007), pp.1–2410.1007/978-3-540-47235-3_1 ↗
22. H.X. Jiang, J.Y. Lin, Optoelectronic Devices III Nitrides (Elsevier B.V, Amsterdam, 2004), pp.133–183
23. G.D. Cody, J. Non Cryst. Solids 141, 3–15 (1992)10.1016/S0022-3093(05)80513-7 ↗
24. F. Urbach, Phys. Rev. 92, 1324 (1953)10.1103/PhysRev.92.1324 ↗
25. S.D. Senol, B. Yalcin, E. Ozugurlu, L. Arda, Mater. Res. Express 7, 5079 (2020)10.1088/2053-1591/ab5eea ↗
26. B. Galvani, D. Suchet, A. Delammare, M. Bescond, F.V. Michelni, M. Lannoo, J.-F. Guillemoles, N. Cavassilas, ACS Omega 4, 21487–21493 (2019)10.1021/acsomega.9b03178 ↗
27. S. Jamil, R.N. Ahmad-bitar, J. Mater. Res. Technol. 2, 221–227 (2013)10.1016/j.jmrt.2013.02.012 ↗
28. A. Amato, S. Terreni, M. Granata, C. Michel, D. Lyon, Sci. Rep. 10, 1–9 (2020)10.1038/s41598-019-56847-4 ↗
29. M.O. Dawood, Int. Lett. Chem. Phys. Astron. 48, 138–145 (2015)10.56431/p-d39km7 ↗
30. S. Duman, B. Gurbulak, S. Dogan, F.S. Ozcelik, J. Phys. Conf. Ser. 707, 012027 (2016)10.1088/1742-6596/707/1/012027 ↗
31. Y. Zhang, Q. Hou, Vacuum 207, 111694 (2023)10.1016/j.vacuum.2022.111694 ↗
32. R.B. Heimann, Materials 16, 5142 (2023)10.3390/ma16145142 ↗
33. M. Kawasaki, M. Nose, I. Onishi, M. Shiojiri, Microsc. Microanal. 2016(22), 673–678 (2016)10.1017/S1431927616000611 ↗
34. P.H. Mayrhofer, C. Mitterer, L. Hultman, H. Clemens, Prog. Mater. Sci. 51, 1032–1114 (2006)10.1016/j.pmatsci.2006.02.002 ↗
35. E. Perrem, R. Henry, F. Peraudeau, G. Armas, B. Berjoan, R. Beche, J. Mater. Sci. 32, 1305–1312 (1997)10.1023/A:1018556606993 ↗
36. M. García-Méndez, S. Morales-Rodríguez, S. Shaji, B. Krishnan, P. Bartolo-Pérez, Surf. Rev. Lett. 18, 23–31 (2011)10.1142/S0218625X1101445X ↗
37. J.A. Taylor, J.W. Rabalais, J. Chem. Phys. 75, 1735–1745 (1981)10.1063/1.442251 ↗
38. S.M. Olhero, F.L. Alves, J.M.F. Ferreir, Advances in Ceramics—Synthesis and Characterization, Processing and Specific Applications (IntechOpen, London, 2011)
39. A. Aarnink, W.A.M. Weishaupt, A. van Silfhout, Appl. Surf. Sci. 45, 37–48 (1990)10.1016/0169-4332(90)90018-U ↗
40. J. Finster, E.D. Klinkenberg, J. Heeg, W. Braun, Vacuum 41, 1586–1589 (1990)10.1016/0042-207X(90)94025-L ↗
41. A. Sayeed, H.K. Rouf, Surf. Interfaces 23, 100968 (2021)10.1016/j.surfin.2021.100968 ↗
42. S. Ebrahimi, B. Yarmand, Phys. B Phys. Condens. Matter. 593, 412292 (2020)10.1016/j.physb.2020.412292 ↗
43. G. Nie, Y. Bao, D. Wan, Y. Tian, J. Adv. Ceram. 6, 288–303 (2017)10.1007/s40145-017-0241-5 ↗
44. T.A. Kuznetsova, T.I. Zubar, V.A. Lapitskaya, K.A. Sudzilovskaya, S.A. Chizhik, V.V. Uglov, V.I. Shymanski, N.T. Kvasov, J. Surf, J Surf. Invest. X-ray Synchrotron Neutron Tech. 13, 408–411 (2019)10.1134/S102745101903011X ↗
45. S. Baskutis, V. Vasauskas, A. Žunda, Mechanika 22, 85–89 (2016)10.5755/j01.mech.22.2.13690 ↗
46. S.K. Mishra, S. Kumari, Soni, Surf. Interface Anal. 49, 345–348 (2017)10.1002/sia.5954 ↗
47. S.M. Deambrosis, V. Zin, F. Montagner, C. Mortalo, M. Fabrizio, E. Miorin, Surf. Coat. Technol. 405, 126556 (2021)10.1016/j.surfcoat.2020.126556 ↗
48. G. McHale, S.M. Rowan, M.I. Newton, M.K. Banerjee, J. Phys. Chem. B 102, 1964–1967 (1998)10.1021/jp972552i ↗
49. J.K. Park, J. Ryu, B.C. Koo, S. Lee, K.H. Kang, Soft Matter 8, 11889–11896 (2012)10.1039/c2sm26559a ↗
50. X. Wang, Z. Chen, Z. Shen, Sci. China Ser. B Chem. 48, 553–559 (2005)10.1360/042004-22 ↗
51. R.N. Wenzel, J. Phys. Chem. 53, 1466–1467 (1949)10.1021/j150474a015 ↗
52. A.B.D. Cassie, S. Baxt, Trans. Faraday Soc. 40, 546–551 (1944)10.1039/tf9444000546 ↗
53. A. Bayat, M. Ebrahimi, A.Z. Moshfegh, Vacuum 101, 279–282 (2014)10.1016/j.vacuum.2013.09.007 ↗
54. H. Yildirim Erbil, C. Elif Cansoy, Langmuir 25, 14135–14145 (2009)10.1021/la902098a ↗
55. D. Kim, N.M. Pugno, S. Ryu, Sci. Rep. 6, 37813 (2016)10.1038/srep37813 ↗
56. P. Roach, N.J. Shirtcliffe, M.I. Newton, Soft Matter 4, 224 (2008)10.1039/B712575P ↗
57. M. Voyiadjis, G.Z. Yaghoobi, Crystals 7, 321 (2017)10.3390/cryst7100321 ↗
58. R.H. Cayton, Proc. RadTech North Am. Charlotte. 2–5 (2004)
59. Y.L.W.U. Linda, G.H. Tan, X.T. Zeng, T.H. Li, Z. Chen, J. Sol-Gel Sci. Technol. 38, 85–89 (2006)10.1007/s10971-006-5917-1 ↗
60. Gwang-Mun. Choi, Jungho Jin, Dahye Shin, Yun Hyeok Kim, Ji-Hoon. Ko, Hyeon-Gyun. Im, Junho Jang, Dongchan Jang, Byeong-Soo. Bae, Adv. Mater. 29, 1–7 (2017)
61. A. Eshaghi, Prog. Org. Coatings 128, 120–126 (2019)10.1016/j.porgcoat.2018.12.021 ↗
62. B. Masheder, C. Urata, A. Hozumi, A.C.S. Appl, Mater. Interfaces 5, 7899–7905 (2013)10.1021/am401992h ↗
63. I.S. Bayer, Coatings 7, 12 (2017)10.3390/coatings7010012 ↗