Dopant–dopant interactions in beryllium doped indium gallium arsenide: An ab initio study
Source abstract
Abstract
We present an ab initio study of dopant-dopant interactions in beryllium-doped InGaAs. We consider defect formation energies of various interstitial and substitutional defects and their combinations. We find that all substitutional-substitutional interactions could be neglected. On the other hand, interactions involving an interstitial defect are significant. Specially, interstitial Be is stabilized by about 0.9/1.0 eV in the presence of one/two BeGasubstitutionals. Ga interstitial is also substantially stabilized by Be substitutionals. Two Be interstitials can form a metastable Be-Be-Ga complex with a dissociation energy of 0.26 eV/Be. Therefore, interstitial defects and defect-defect interactions should be considered in accurate models of Be-doped InGaAs. We suggest that In and Ga should be treated as separate atoms and not lumped into a single effective group III element, as has been done before. We identified dopant-centred states which indicate the presence of other charge states at finite temperatures, specifically, the presence of Beint+1(as opposed to Beint+2at 0 K).
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Research context
OpenAlex topics: Advancements in Battery Materials · Glass properties and applications · Advanced Battery Materials and Technologies
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References (48)
Show source-provided references
1. 10.1016/j.jpowsour.2013.01.11410.1016/j.jpowsour.2013.01.114 ↗
2. 10.1103/RevModPhys.86.25310.1103/RevModPhys.86.253 ↗
3. 10.1063/1.489461710.1063/1.4894617 ↗
4. 10.1021/nl904132v10.1021/nl904132v ↗
5. 10.1103/PhysRevB.50.1795310.1103/PhysRevB.50.17953 ↗
6. 10.1063/1.470454610.1063/1.4704546 ↗
7. 10.1016/S0169-4332(03)00392-110.1016/S0169-4332(03)00392-1 ↗
8. 10.1103/PhysRevB.84.18410810.1103/PhysRevB.84.184108 ↗
9. 10.1021/nl903183n10.1021/nl903183n ↗
10. 10.1021/cr200107z10.1021/cr200107z ↗
11. 10.1016/j.actamat.2016.12.00410.1016/j.actamat.2016.12.004 ↗
12. 10.1063/1.168267310.1063/1.1682673 ↗
13. 10.1021/jp104289x10.1021/jp104289x ↗
14. 10.1063/1.11475310.1063/1.114753 ↗
15. 10.1038/nature1067710.1038/nature10677 ↗
16. 10.1063/1.476335310.1063/1.4763353 ↗
17. 10.1103/PhysRevLett.77.386510.1103/PhysRevLett.77.3865 ↗
18. 10.1063/1.497384110.1063/1.4973841 ↗
19. 10.1017/S030500410003040110.1017/S0305004100030401 ↗
20. 10.1557/mrc.2017.6910.1557/mrc.2017.69 ↗
21. 10.1016/j.jpowsour.2014.10.03710.1016/j.jpowsour.2014.10.037 ↗
22. 10.1021/jp307221q10.1021/jp307221q ↗
23. 10.1103/PhysRevLett.100.14640110.1103/PhysRevLett.100.146401 ↗
24. 10.1063/1.194853310.1063/1.1948533 ↗
25. 10.1103/PhysRevB.76.16520210.1103/PhysRevB.76.165202 ↗
26. 10.1063/1.36025310.1063/1.360253 ↗
27. A comprehensive study of beryllium diffusion in InGaAs using different forms of kick-out mechanism
28. Endoh · 2012 · 48
29. 10.1109/SISPAD.2014.693161310.1109/SISPAD.2014.6931613 ↗
30. 10.7567/APEX.6.02730110.7567/APEX.6.027301 ↗
31. 10.1016/j.nanoen.2013.04.00710.1016/j.nanoen.2013.04.007 ↗
32. 10.1016/j.ssi.2013.09.03810.1016/j.ssi.2013.09.038 ↗
33. 10.1103/PhysRevB.77.24520210.1103/PhysRevB.77.245202 ↗
34. 10.1063/1.346299810.1063/1.3462998 ↗
35. First principles study of lithium insertion in bulk silicon
36. 10.1021/jp111597710.1021/jp1115977 ↗
37. 10.1016/j.susc.2013.02.00410.1016/j.susc.2013.02.004 ↗
38. 10.1021/jp108389910.1021/jp1083899 ↗
39. 10.1557/adv.2017.35610.1557/adv.2017.356 ↗
40. 10.1103/PhysRevB.81.24521610.1103/PhysRevB.81.245216 ↗
41. 10.1063/1.497494910.1063/1.4974949 ↗
42. 10.1103/PhysRevB.59.175810.1103/PhysRevB.59.1758 ↗
43. 10.1103/PhysRevB.54.1116910.1103/PhysRevB.54.11169 ↗
44. 10.1103/PhysRevB.13.518810.1103/PhysRevB.13.5188 ↗
45. 10.1063/1.10253310.1063/1.102533 ↗
46. 10.1002/qua.56028084610.1002/qua.560280846 ↗
47. 10.1126/science.115872210.1126/science.1158722 ↗
48. Comparison of vacancy and antisite defects in GaAs and InGaAs through hybrid functionals