journal article·2000-07

Annealing-induced Changes in the Electronic and Structural Properties of ZnTe Substrates

J. A. Garcia, A. Remón, V. Munñz, R. Triboulet

Journal of Materials Research· Volume 15· Issue 7
Publisher page

Abstract

The aim of this study is to demonstrate that the electronic and structural properties of II–VI substrates, here ZnTe, can be dramatically affected by thermal heating at temperatures in the range of those typically used in the epitaxial metalorganic chemical vapor deposition processes. Photoluminescence response shows that annealing at these temperatures produces a reduction of the sample crystalline quality, decreasing the free exciton emission relative to the deep level related one. Some factors, like the change in the charge and stress state of dislocations, Cu diffusion, and oxygen incorporation, could be responsible for changes in the substrate properties, which can produce stresses and contamination in the deposited sample.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: GaN-based semiconductor devices and materials · Semiconductor Quantum Structures and Devices · Chalcogenide Semiconductor Thin Films

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (14)

Show source-provided references
1. 10.1103/PhysRevLett.8.39110.1103/PhysRevLett.8.391 ↗
2. 10.1016/S0022-0248(98)00392-310.1016/S0022-0248(98)00392-3 ↗
3. 10.1143/JJAP.28.L134110.1143/JJAP.28.L1341 ↗
4. 10.1063/1.35846310.1063/1.358463 ↗
5. 10.1016/0038-1098(94)90864-810.1016/0038-1098(94)90864-8 ↗
6. 10.1088/0268-1242/13/4/01010.1088/0268-1242/13/4/010 ↗
7. 10.1063/1.35307110.1063/1.353071 ↗
8. 10.1103/PhysRevB.22.298310.1103/PhysRevB.22.2983 ↗
9. 10.1143/JJAP.33.L98010.1143/JJAP.33.L980 ↗
10. 10.1063/1.34401610.1063/1.344016 ↗
11. 10.1016/0022-0248(88)90601-X10.1016/0022-0248(88)90601-X ↗
12. 10.1016/0960-8974(95)00018-610.1016/0960-8974(95)00018-6 ↗
13. 10.1016/0022-0248(94)90810-910.1016/0022-0248(94)90810-9 ↗
14. 10.1143/JJAP.38.512310.1143/JJAP.38.5123 ↗