journal article·2007-10

The depth distribution of residual stresses in (Ti,Al)N films: Measurement and analysis

Sheng-Sheng Zhao, Hao Du, Wei-Gang Hua, Jun Gong, Jia-Bao Li, Chao Sun

Journal of Materials Research· Volume 22· Issue 10
Publisher page

Abstract

A method is introduced to determine the depth distribution of the residual stresses in (Ti,Al)N films. The films were gradually stripped by chemical corrosion, an optical system was designed to test the curvature change of the specimens, and the depth distribution of the residual stresses was calculated. The results show that the residual stresses increase gradually from the interface of film/substrate and reach a maximum value at the middle region, then decrease until the surface.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Metal and Thin Film Mechanics · Semiconductor materials and devices · Acoustic Wave Resonator Technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (20)

Show source-provided references
1. 10.1016/0257-8972(88)90006-010.1016/0257-8972(88)90006-0 ↗
2. 10.1007/BF0055147610.1007/BF00551476 ↗
3. 10.1016/S0042-207X(99)00135-910.1016/S0042-207X(99)00135-9 ↗
4. 10.1016/0040-6090(85)90278-010.1016/0040-6090(85)90278-0 ↗
5. 10.1063/1.142627110.1063/1.1426271 ↗
6. 10.1002/(SICI)1521-396X(199804)166:2<751::AID-PSSA751>3.0.CO;2-L10.1002/(SICI)1521-396X(199804)166:2<751::AID-PSSA751>3.0.CO;2-L ↗
7. 10.1016/S0257-8972(02)00671-010.1016/S0257-8972(02)00671-0 ↗
8. 10.1179/02670840110151756610.1179/026708401101517566 ↗
9. 10.1016/0257-8972(88)90007-210.1016/0257-8972(88)90007-2 ↗
10. 10.1016/S0257-8972(01)01448-710.1016/S0257-8972(01)01448-7 ↗
11. 10.1016/S0040-6090(02)00680-610.1016/S0040-6090(02)00680-6 ↗
12. 10.1063/1.114256710.1063/1.1142567 ↗
13. 10.1016/0925-9635(94)05327-810.1016/0925-9635(94)05327-8 ↗
14. 10.1016/S0040-6090(96)09569-710.1016/S0040-6090(96)09569-7 ↗
15. 4 Stoney G.G. The tension of metallic films deposited by electrolysis.Proc. R. Soc. London Ser. A,82, 172 (1909)10.1098/rspa.1909.0021 ↗
16. 10.4028/www.scientific.net/MSF.524-525.61910.4028/www.scientific.net/MSF.524-525.619 ↗
17. 10.1142/S021797920200962710.1142/S0217979202009627 ↗
18. 10.1016/S0040-6090(97)00588-910.1016/S0040-6090(97)00588-9 ↗
19. 10.1063/1.139122310.1063/1.1391223 ↗
20. 10.1016/S0921-5093(02)00259-910.1016/S0921-5093(02)00259-9 ↗