DataVXJournal of Materials ResearchPaper
journal article·2006-07-01

Plasma-assisted metalorganic chemical vapor deposition growth of ZnO thin films

Maria Losurdo, Maria M. Giangregorio, A. Sacchetti, Pio Capezzuto, Giovanni Bruno, Graziella Malandrino, Ignazio L. Fragalà

Journal of Materials Research· Volume 21· Issue 7
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Source abstract

Abstract

ZnO thin films have been grown by metalorganic chemical vapor deposition (MOCVD) and plasma-assisted (PA) MOCVD on c-axis-oriented sapphire (0001) and Si (001) substrates using the novel Zn(2-thenoyltrifluoroacetonate)2·N,N,N′,N′-tetramethylethylendiamine precursor. The structural, morphological, and optical properties of ZnO films have been investigated. The results show that the O2 PA growth results in highly c-axis-oriented hexagonal ZnO thin films also on cubic substrates. PA-MOCVD ZnO films have good optical properties, as inferred by the presence of a sharp and intense exciton in the dielectric function.
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Research context

Materials processing

OpenAlex topics: ZnO doping and properties · Copper-based nanomaterials and applications · Gas Sensing Nanomaterials and Sensors

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