journal article·2024-05-28Open access

Low-voltage short-channel MoS2 memtransistors with high gate-tunability

Stephanie E. Liu, Thomas T. Zeng, Ruiqin Wu, Vinod K. Sangwan, Mark C. Hersam

Journal of Materials Research· Volume 39· Issue 10

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Advanced Memory and Neural Computing · Ferroelectric and Negative Capacitance Devices · 2D Materials and Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (52)

Show source-provided references
1. T.N. Theis, H.-S.P. Wong, Computing in Science. Engineering 19, 41–50 (2017). https://doi.org/10.1109/MCSE.2017.2910.1109/MCSE.2017.29 ↗
2. C.E. Leiserson, N.C. Thompson, J.S. Emer, B.C. Kuszmaul, B.W. Lampson, D. Sanchez, T.B. Schardl, Science 368, eaam9744 (2020). https://doi.org/10.1126/science.aam974410.1126/science.aam9744 ↗
3. W. Aspray, John von Neumann and the Origins of Modern Computing (MIT Press, Cambridge, 1990)
4. J. Backus, Comm ACM 21, 613–641 (1978). https://doi.org/10.1145/359576.35957910.1145/359576.359579 ↗
5. X. Zou, S. Xu, X. Chen, L. Yan, Y. Han, Sci. China Info Sci. 64, 160404 (2021). https://doi.org/10.1007/s11432-020-3227-110.1007/s11432-020-3227-1 ↗
6. D. Marković, A. Mizrahi, D. Querlioz, J. Grollier, Nat. Rev. Phys. 2, 499–510 (2020). https://doi.org/10.1038/s42254-020-0208-210.1038/s42254-020-0208-2 ↗
7. X. Yan, J.H. Qian, V.K. Sangwan, M.C. Hersam, Adv. Mater. 34, 2270330 (2022). https://doi.org/10.1002/adma.20227033010.1002/adma.202270330 ↗
8. V.K. Sangwan, S.E. Liu, A.R. Trivedi, M.C. Hersam, Matter. 5, 4133–4152 (2022). https://doi.org/10.1016/j.matt.2022.10.01710.1016/j.matt.2022.10.017 ↗
9. H.-S.P. Wong, S. Raoux, S. Kim, J. Liang, J.P. Reifenberg, B. Rajendran, M. Asheghi, K.E. Goodson, Proc. IEEE 98, 2201–2227 (2010). https://doi.org/10.1109/JPROC.2010.207005010.1109/JPROC.2010.2070050 ↗
10. U. Celano, L. Goux, A. Belmonte, K. Opsomer, A. Franquet, A. Schulze, C. Detavernier, O. Richard, H. Bender, M. Jurczak, W. Vandervorst, Nano Lett. 14, 2401–2406 (2014). https://doi.org/10.1021/nl500049g10.1021/nl500049g ↗
11. K.M. Kim, J. Zhang, C. Graves, J.J. Yang, B.J. Choi, C.S. Hwang, Z. Li, R.S. Williams, Nano Lett. 16, 6724–6732 (2016). https://doi.org/10.1021/acs.nanolett.6b0178110.1021/acs.nanolett.6b01781 ↗
12. L. Chua, IEEE Trans Circuit Theory. 18, 507–519 (1971). https://doi.org/10.1109/TCT.1971.108333710.1109/TCT.1971.1083337 ↗
13. D.B. Strukov, G.S. Snider, D.R. Stewart, R.S. Williams, Nature 453, 80–83 (2008). https://doi.org/10.1038/nature0693210.1038/nature06932 ↗
14. M. Li, H. Liu, R. Zhao, F.-S. Yang, M. Chen, Y. Zhuo, C. Zhou, H. Wang, Y.-F. Lin, J.J. Yang, Nat. Electron. 6, 491–505 (2023). https://doi.org/10.1038/s41928-023-00984-210.1038/s41928-023-00984-2 ↗
15. M.-K. Kim, J.-S. Lee, Nano Lett. 19, 2044–2050 (2019). https://doi.org/10.1021/acs.nanolett.9b0018010.1021/acs.nanolett.9b00180 ↗
16. J. Zhu, Y. Yang, R. Jia, Z. Liang, W. Zhu, Z.U. Rehman, L. Bao, X. Zhang, Y. Cai, L. Song, R. Huang, Adv. Mater. 30, 1800195 (2018). https://doi.org/10.1002/adma.20180019510.1002/adma.201800195 ↗
17. S. Kim, B. Choi, M. Lim, J. Yoon, J. Lee, H.-D. Kim, S.-J. Choi, ACS Nano 11, 2814–2822 (2017). https://doi.org/10.1021/acsnano.6b0789410.1021/acsnano.6b07894 ↗
18. V.K. Sangwan, H.-S. Lee, H. Bergeron, I. Balla, M.E. Beck, K.-S. Chen, M.C. Hersam, Nature 554, 500–504 (2018). https://doi.org/10.1038/nature2574710.1038/nature25747 ↗
19. H. Lee, V.K. Sangwan, W.A.G. Rojas, H. Bergeron, H.Y. Jeong, J. Yuan, K. Su, M.C. Hersam, Adv. Funct. Mater. 30, 2003683 (2020). https://doi.org/10.1002/adfm.20200368310.1002/adfm.202003683 ↗
20. J. Yuan, S.E. Liu, A. Shylendra, W.A. Gaviria Rojas, S. Guo, H. Bergeron, S. Li, H.S. Lee, S. Nasrin, V.K. Sangwan, A.R. Trivedi, M.C. Hersam, Nano Lett. (2021). https://doi.org/10.1021/acs.nanolett.1c0098210.1021/acs.nanolett.1c00982 ↗
21. V.K. Sangwan, M.C. Hersam, Annu. Rev. Phys. Chem. 69, 299–325 (2018). https://doi.org/10.1146/annurev-physchem-050317-02135310.1146/annurev-physchem-050317-021353 ↗
22. V.K. Sangwan, M.C. Hersam, Nat Nano. 15, 517–528 (2020). https://doi.org/10.1038/s41565-020-0647-z10.1038/s41565-020-0647-z ↗
23. X. Li, L. Tao, Z. Chen, H. Fang, X. Li, X. Wang, J.-B. Xu, H. Zhu, Appl. Phys. Rev. 4, 021306 (2017). https://doi.org/10.1063/1.498364610.1063/1.4983646 ↗
24. T. Heine, Accounts Chem Res. 48, 65–72 (2014). https://doi.org/10.1021/ar500277z10.1021/ar500277z ↗
25. D. Akinwande, C.J. Brennan, J.S. Bunch, P. Egberts, J.R. Felts, H. Gao, R. Huang, J.-S. Kim, T. Li, Y. Li, K.M. Liechti, N. Lu, H.S. Park, E.J. Reed, P. Wang, B.I. Yakobson, T. Zhang, Y.-W. Zhang, Y. Zhou, Y. Zhu, Extreme Mech. Lett. 13, 42–77 (2017). https://doi.org/10.1016/j.eml.2017.01.00810.1016/j.eml.2017.01.008 ↗
26. M. Chhowalla, H.S. Shin, G. Eda, L.-J. Li, K.P. Loh, H. Zhang, Nat. Chem. 5, 263–275 (2013). https://doi.org/10.1038/nchem.158910.1038/nchem.1589 ↗
27. L. Wang, W. Liao, S.L. Wong, Z.G. Yu, S. Li, Y. Lim, X. Feng, W.C. Tan, X. Huang, L. Chen, L. Liu, J. Chen, X. Gong, C. Zhu, X. Liu, Y. Zhang, D. Chi, K. Ang, Adv. Funct. Mater. 29, 1901106 (2019). https://doi.org/10.1002/adfm.20190110610.1002/adfm.201901106 ↗
28. V.K. Sangwan, D. Jariwala, I.S. Kim, K.-S. Chen, T.J. Marks, L.J. Lauhon, M.C. Hersam, Nat. Nanotechnol. 10, 403–406 (2015). https://doi.org/10.1038/nnano.2015.5610.1038/nnano.2015.56 ↗
29. J. Jadwiszczak, D. Keane, P. Maguire, C.P. Cullen, Y. Zhou, H. Song, C. Downing, D. Fox, N. McEvoy, R. Zhu, J. Xu, G.S. Duesberg, Z.-M. Liao, J.J. Boland, H. Zhang, ACS Nano 13, 14262–14273 (2019). https://doi.org/10.1021/acsnano.9b0742110.1021/acsnano.9b07421 ↗
30. Y. Sun, Y. Wang, Q. Yuan, B. Li, Mater. Today Nano 24, 100398 (2023). https://doi.org/10.1016/j.mtnano.2023.10039810.1016/j.mtnano.2023.100398 ↗
31. L. Rahimifard, A. Shylendra, S. Nasrin, S.E. Liu, V.K. Sangwan, M.C. Hersam, A.R. Trivedi, Front Electron Mater. 2, 950487 (2022). https://doi.org/10.3389/femat.2022.95048710.3389/femat.2022.950487 ↗
32. X. Feng, S. Li, S.L. Wong, S. Tong, L. Chen, P. Zhang, L. Wang, X. Fong, D. Chi, K.-W. Ang, ACS Nano 15, 1764–1774 (2021). https://doi.org/10.1021/acsnano.0c0944110.1021/acsnano.0c09441 ↗
33. J.S. Lee, S. Lee, T.W. Noh, Appl. Phys. Rev. 2, 031303 (2015). https://doi.org/10.1063/1.492951210.1063/1.4929512 ↗
34. X. Wang, B. Wang, Q. Zhang, Y. Sun, E. Wang, H. Luo, Y. Wu, L. Gu, H. Li, K. Liu, Adv. Mater. 33, 2102435 (2021). https://doi.org/10.1002/adma.20210243510.1002/adma.202102435 ↗
35. A.J. Kumar, G. Sheoran, M. Shrivastava, Npj 2D Mater. Appl. 4, 37 (2020). https://doi.org/10.1038/s41699-020-00171-310.1038/s41699-020-00171-3 ↗
36. K. Cho, W. Park, J. Park, H. Jeong, J. Jang, T.-Y. Kim, W.-K. Hong, S. Hong, T. Lee, ACS Nano 7, 7751–7758 (2013). https://doi.org/10.1021/nn402348r10.1021/nn402348r ↗
37. E. Mansfield, D. Goggin, J. Killgore, T. Aubry, MRS Comm. 12, 878–885 (2022). https://doi.org/10.1557/s43579-022-00261-x10.1557/s43579-022-00261-x ↗
38. J. Pak, Y. Jang, J. Byun, K. Cho, T.-Y. Kim, J.-K. Kim, B.Y. Choi, J. Shin, Y. Hong, S. Chung, T. Lee, ACS Nano 12, 7109–7116 (2018). https://doi.org/10.1021/acsnano.8b0292510.1021/acsnano.8b02925 ↗
39. G. Arutchelvan, C.J. Lockhart de la Rosa, P. Matagne, S. Sutar, I. Radu, C. Huyghebaert, S. De Gendt, M. Heyns, Nanoscale 9, 10869–10879 (2017). https://doi.org/10.1039/C7NR02487H10.1039/C7NR02487H ↗
40. A. Leonhardt, D. Chiappe, V.V. Afanas’ev, S. El Kazzi, I. Shlyakhov, T. Conard, A. Franquet, C. Huyghebaert, S. de Gendt, ACS Appl. Mater. Inter. 11, 42697–42707 (2019). https://doi.org/10.1021/acsami.9b1155010.1021/acsami.9b11550 ↗
41. D. Kudithipudi, A. Daram, A.M. Zyarah, F.T. Zohora, J.B. Aimone, A. Yanguas-Gil, N. Soures, E. Neftci, M. Mattina, V. Lomonaco, C.D. Thiem, B. Epstein, Nat. Electron. 6, 807–822 (2023). https://doi.org/10.1038/s41928-023-01054-310.1038/s41928-023-01054-3 ↗
42. J. Knoch, B. Sun, IEEE Trans. Electron Dev. 69, 2243–2247 (2022). https://doi.org/10.1109/TED.2022.316124510.1109/TED.2022.3161245 ↗
43. A. Prakash, H. Ilatikhameneh, P. Wu, J. Appenzeller, Sci. Rep. 7, 12596 (2017). https://doi.org/10.1038/s41598-017-12816-310.1038/s41598-017-12816-3 ↗
44. M. Lanza, R. Waser, D. Ielmini, J.J. Yang, L. Goux, J. Suñe, A.J. Kenyon, A. Mehonic, S. Spiga, V. Rana, S. Wiefels, S. Menzel, I. Valov, M.A. Villena, E. Miranda, X. Jing, F. Campabadal, M.B. Gonzalez, F. Aguirre, F. Palumbo, K. Zhu, J.B. Roldan, F.M. Puglisi, L. Larcher, T.-H. Hou, T. Prodromakis, Y. Yang, P. Huang, T. Wan, Y. Chai, K.L. Pey, N. Raghavan, S. Dueñas, T. Wang, Q. Xia, S. Pazos, ACS Nano 15, 17214–17231 (2021). https://doi.org/10.1021/acsnano.1c0698010.1021/acsnano.1c06980 ↗
45. W. Huh, D. Lee, S. Jang, J.H. Kang, T.H. Yoon, J. So, Y.H. Kim, J.C. Kim, H. Park, H.Y. Jeong, G. Wang, C. Lee, Adv. Mater. 35, 2211525 (2023). https://doi.org/10.1002/adma.20221152510.1002/adma.202211525 ↗
46. J.F. Leong, Z. Fang, M. Sivan, J. Pan, B. Tang, E. Zamburg, A.V. Thean, Adv. Funct. Mater. 33, 2302949 (2023). https://doi.org/10.1002/adfm.20230294910.1002/adfm.202302949 ↗
47. M. Sivan, J.F. Leong, J. Ghosh, B. Tang, J. Pan, E. Zamburg, A.V.-Y. Thean, ACS Nano 16, 14308–14322 (2022). https://doi.org/10.1021/acsnano.2c0450410.1021/acsnano.2c04504 ↗
48. J. Wang, D. He, R. Chen, H. Xu, H. Wang, M. Yang, Q. Zhang, C. Jiang, W. Li, X. Ouyang, X. Xiao, InfoMat 5, e12476 (2023). https://doi.org/10.1002/inf2.1247610.1002/inf2.12476 ↗
49. D.A. Nguyen, Y. Jo, T.U. Tran, M.S. Jeong, H. Kim, H. Im, Small Methods 5, 2101303 (2021). https://doi.org/10.1002/smtd.20210130310.1002/smtd.202101303 ↗
50. S. Iqbal, L.T. Duy, H. Kang, R. Singh, M. Kumar, J. Park, H. Seo, Adv. Funct. Mater. 31, 2102567 (2021). https://doi.org/10.1002/adfm.20210256710.1002/adfm.202102567 ↗
51. J. Yang, A. Yoon, D. Lee, S. Song, I.J. Jung, D. Lim, H. Jeong, Z. Lee, M. Lanza, S. Kwon, Adv. Funct. Mater. 34, 2309455 (2023). https://doi.org/10.1002/adfm.20230945510.1002/adfm.202309455 ↗
52. W. Li, J. Zhou, S. Cai, Z. Yu, J. Zhang, N. Fang, T. Li, Y. Wu, T. Chen, X. Xie, H. Ma, K. Yan, N. Dai, X. Wu, H. Zhao, Z. Wang, D. He, L. Pan, Y. Shi, P. Wang, W. Chen, K. Nagashio, X. Duan, X. Wang, Nat. Electron. 2, 563–571 (2019). https://doi.org/10.1038/s41928-019-0334-y10.1038/s41928-019-0334-y ↗