A review of monolithic and multilayer coatings within the boron–carbon–nitrogen system by ion-beam-assisted deposition

A review is given on the use of ion-beam-assisted deposition (IBAD) to the growth of films within the B–C–N system, both as monolithic and multilayer coatings. The films considered include elemental, binary, and ternary materials like pure carbon (diamond-like carbon), pure boron (B), boron nitrides (c‑BN, h‑BN, and BNx), boron carbides (B4C and BxC), carbon nitrides (CNx), and ternary BxCyNz. The use of non-reactive IBAD with argon ions and reactive IBAD with nitrogen ions is discussed in connection with control of the composition, physical and chemical sputtering, film density, internal stress, and promotion of metastable phases.