Chemical sensors based on dielectric response of functionalized mesoporous silica films

Karel Domansky; Jun Liu; Li-Qiong Wang; Mark H. Engelhard; Suresh Baskaran

doi:10.1557/jmr.2001.0387

journal article·2001-10

Chemical sensors based on dielectric response of functionalized mesoporous silica films

Karel Domansky, Jun Liu, Li-Qiong Wang, Mark H. Engelhard, Suresh Baskaran

Journal of Materials Research· Volume 16· Issue 10

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Source abstract

Abstract

Dielectric response of mesoporous silica films was monitored as a function of several gas-phase chemical species. The effects of humidity, ammonia, and methane on dielectric constant and dissipation factor of films subjected to different chemical treatments are described. Dielectric constant and dissipation factor of partially dehydroxylated films were found to be highly sensitive to both water vapor and ammonia in air. The capacitive devices based on mesoporous silica films show potential for use in chemical sensors.

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Research context

OpenAlex topics: Analytical Chemistry and Sensors · Gas Sensing Nanomaterials and Sensors · Mesoporous Materials and Catalysis

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

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