Atomic layer deposition of tungsten disulphide solid lubricant thin films

The synthesis and characterization of crystalline tungsten disulphide (WS₂) solid lubricant thin films grown by atomic layer deposition (ALD) using WF₆ and H₂S gas precursors was studied. A new catalytic route was established to promote nucleation and growth of WS₂ films on silicon surfaces with native oxide. Scanning electron microscopy with energy dispersive spectroscopy and Raman spectroscopy were used to determine the film morphology, composition, and crystallinity. The films exhibited solid lubricating behavior with a steady-state friction coefficient of 0.04 in a dry nitrogen environment.