Investigation on Microstructure Evolution and Visible-Infrared Property of Vacuum-Heat-Treated TiN Film
Source abstract
Abstract
TiN films were prepared by direct current (DC) reactive magnetron sputtering technique and then vacuum-heat-treated at different temperatures (400, 600 and 800 °C) for 3600 s to improve their properties through increasing the crystallinity and eliminating the lattice defects of the films. Optical properties in the visible-infrared region of TiN films after vacuum heat treatment were investigated. Results revealed that optical reflectance of TiN films first increased and then decreased after the vacuum heat treatment. The reflectance of all the films was below 14%. With the heat treatment temperature rising from 400 to 600 °C, infrared emissivity of TiN films first dropped and then went up at 800 °C. As the heat treatment temperature was 600 °C, the infrared emissivity of TiN films could be reduced to 0.488 and was the lowest. Results showed that vacuum heat treatment could reduce the infrared emissivity of TiN films.
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Research context
OpenAlex topics: Metal and Thin Film Mechanics · GaN-based semiconductor devices and materials · ZnO doping and properties
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (34)
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