Structure and Electrochemical Behavior of AlN, AlTiN, and AlTiSiN Physical Vapor Deposition Coatings in 3% NaCl Solution
Source abstract
Abstract
Thin coatings AlN, AlTiN, and AlTiSiN were deposited by pulsed magnetron sputtering. High-speed steel T1, structural carbon steel 1017, and hard alloy HG30 were used as substrates. The magnetron current, nitrogen content in the gas mixture, and bias voltage on the substrate were changed to obtain nanostructured and amorphous coating layers with different elemental compositions. The microstructure, defects, and elemental composition of the coatings were investigated on an Ultra 55 field emission electron microscope with an EDX microanalysis system. Voltammetry and impedance spectroscopy was performed on coated samples in 3% NaCl solution. The corrosion behavior of the coatings was characterized by the corrosion current density icorr and the polarization resistance Rp (at the corrosion potential). The research shows that the investigated coatings (except for AlN) are electrochemically active, and corrosion processes occur not only on the substrate in the discontinuities of the coating but also on the coating surface. The corrosion current density for AlN and AlTiSiN coatings on a T1 substrate is about 0.1 μA cm−2. The paper discusses factors influencing the corrosion behavior of the coatings under study. Graphical Abstract
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Research context
OpenAlex topics: Metal and Thin Film Mechanics · Semiconductor materials and devices · Copper Interconnects and Reliability
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References (31)
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