Ion-beam-induced interfacial blistering of chromium masks on lithium tantalate substrates: origins and suppression strategies
Source abstract
Abstract
Ion-beam-induced blistering at Cr/LiTaO 3 interfaces originates from organic contaminants. Suppression is achieved by increasing Cr thickness or post-annealing, which blocks ion penetration or creates gas-venting channels, respectively.
Only a short abstract or summary was supplied by the source.
Source: crossref · Quality: short
Research context
OpenAlex topics: Photorefractive and Nonlinear Optics · Nonlinear Optical Materials Studies · Laser Material Processing Techniques
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
School of Chemistry and Chemical Engineering, Shandong University, Jinan, Shandong 250100, China
School of Microelectronics and Communication Engineering, Chongqing University, Chongqing 400044, China
State Key Laboratory of Crystal Materials, Shandong University, Jinan, Shandong 250100, China
School of Physics, State Key Laboratory of Crystal Materials, Shandong University, Jinan, Shandong 250100, China
Funding
National Natural Science Foundation of China · Natural Science Foundation of Shandong Province · Shandong University
References (46)
Show source-provided references
1. Boes · Science · 2023 · 379 · eabj439610.1126/science.abj4396 ↗
2. Yang · Opto-Electron. Adv. · 2025 · 8 · 240193-110.29026/oea.2025.240193 ↗
3. Jia · Appl. Phys. Rev. · 2021 · 8 · 01130710.1063/5.0037771 ↗
4. Kozlov · Appl. Sci. · 2023 · 13 · 209710.3390/app13042097 ↗
5. Shen · Nanomaterials · 2023 · 13 · 278910.3390/nano13202789 ↗
6. R. E.Lee , Ion-Beam Etching (Milling) , in VLSI Electronics Microstructure Science , ed. N. G. Einspruch , D. M. Brown , Elsevier , 1984 , ch. 11, pp. 341–364
7. Si · J. Vac. Sci. Technol. B · 2011 · 29 · 02120510.1116/1.3557027 ↗
8. Lacour · Opt. Mater. · 2005 · 27 · 142110.1016/j.optmat.2004.07.016 ↗
9. Yan · Opt. Lett. · 2020 · 45 · 410010.1364/OL.394171 ↗
10. Chiarini · Nucl. Instrum. Methods Phys. Res., Sect. B · 2010 · 268 · 304910.1016/j.nimb.2010.05.038 ↗
11. Ampere · J. Micromech. Microeng. · 2004 · 14 · R1510.1088/0960-1317/14/4/R01 ↗
12. Stevens-Kalceff · MRS Online Proc. Libr. · 2003 · 792 · 74
13. Harriott · J. Vac. Sci. Technol., A · 1990 · 8 · 89910.1116/1.576893 ↗
14. Greenzweig · Microelectron. Eng. · 2016 · 155 · 1910.1016/j.mee.2016.01.016 ↗
15. Gao · Appl. Phys. Rev. · 2025 · 12 · 03140410.1063/5.0258436 ↗
16. Wang · Laser Photonics Rev. · 2025 · 19 · e0101010.1002/lpor.202501010 ↗
17. Ziegler · Nucl. Instrum. Methods Phys. Res., Sect. B · 2010 · 268 · 181810.1016/j.nimb.2010.02.091 ↗
18. Tuda · Appl. Phys. Lett. · 2001 · 79 · 253510.1063/1.1409952 ↗
19. Schwarz · Microsc. Microanal. · 2024 · 30 · 110910.1093/mam/ozae006 ↗
20. Zhang · Nucl. Mater. Energy · 2023 · 36 · 10147810.1016/j.nme.2023.101478 ↗
21. Sreelakshmi · Appl. Phys. A:Mater. Sci. Process. · 2024 · 130 · 57910.1007/s00339-024-07733-y ↗
22. Jian · Int. J. Solids Struct. · 2024 · 305 · 11305810.1016/j.ijsolstr.2024.113058 ↗
23. S.Li , P.Repo , GvGastrow , Y.Bao and H.Savin , Effect of ALD reactants on blistering of aluminum oxide films on crystalline silicon, 2013 IEEE 39th Photovoltaic Specialists Conference (PVSC), 2013 , pp. 1265-1267
24. Beldarrain · J. Vac. Sci. Technol., A · 2012 · 31 · 01A12810.1116/1.4768170 ↗
25. Kim · Appl. Surf. Sci. · 2017 · 409 · 14010.1016/j.apsusc.2017.02.195 ↗
26. Wang · Int. J. Smart Nano Mater. · 2025 · 16 · 34310.1080/19475411.2025.2493663 ↗
27. G. S.Was , Radiation-Enhanced Diffusion and Defect Reaction Rate Theory , in Fundamentals of Radiation Materials Science: Metals and Alloys , ed. G. S. Was , Springer , New York, NY , 2017 , pp. 207–25210.1007/978-1-4939-3438-6_5 ↗
28. Pauleau · Vacuum · 2001 · 61 · 17510.1016/S0042-207X(00)00475-9 ↗
29. Abadias · Vacuum · 2014 · 100 · 3610.1016/j.vacuum.2013.07.041 ↗
30. Koenig · Surf. Coat. Technol. · 2021 · 412 · 12697310.1016/j.surfcoat.2021.126973 ↗
31. D’Heurle · Metall. Trans. · 1970 · 1 · 72510.1007/BF02811600 ↗
32. Li · Scr. Mater. · 2024 · 252 · 11628410.1016/j.scriptamat.2024.116284 ↗
33. Zhang · Surf. Coat. Technol. · 2013 · 224 · 12010.1016/j.surfcoat.2013.03.009 ↗
34. Xu · Plasma Sci. Technol. · 2003 · 5 · 184110.1088/1009-0630/5/3/015 ↗
35. Kalinichenko · Nucl. Instrum. Methods Phys. Res., Sect. B · 2010 · 268 · 224610.1016/j.nimb.2010.04.001 ↗
36. Chen · J. Mater. Res. · 2001 · 16 · 297410.1557/JMR.2001.0408 ↗
37. Suresh · Acta Mater. · 1998 · 46 · 575510.1016/S1359-6454(98)00226-2 ↗
38. Messier · J. Vac. Sci. Technol., A · 1984 · 2 · 50010.1116/1.572604 ↗
39. Thomas · Ultramicroscopy · 1985 · 18 · 17310.1016/0304-3991(85)90135-4 ↗
40. Krempl · Mech. Res. Commun. · 1980 · 7 · 28310.1016/0093-6413(80)90063-4 ↗
41. Wan · Mater. Today Chem. · 2026 · 53 · 10352810.1016/j.mtchem.2026.103528 ↗
42. Wan · Appl. Surf. Sci. · 2023 · 622 · 15697810.1016/j.apsusc.2023.156978 ↗
43. K.Hadjiivanov , Chapter Two - Identification and Characterization of Surface Hydroxyl Groups by Infrared Spectroscopy , in, Advances in Catalysis , ed. F. C. Jentoft , Academic Press , 2014 , pp. 99–318
44. Contarini · Appl. Surf. Sci. · 1987 · 28 · 29110.1016/0169-4332(87)90130-9 ↗
45. Mridha · Phys. Rev. Mater. · 2023 · 7 · 11360510.1103/PhysRevMaterials.7.113605 ↗
46. Banday · Prog. Addit. Manuf. · 202610.1007/s40964-026-01742-4 ↗