journal article·2026

Doping and defect co-engineering strategy to overcome the gain-speed dilemma of a Ga 2 O 3 thin film grown by the mist-CVD technique

Suhao Yao, Xueqiang Ji, Maolin Zhang, Lili Yang, Jia-Han Zhang, Shan Li, Zeng Liu, Weihua Tang

Publisher page

Abstract

The simultaneous modulation of chemical composition and energy band structure contributes to high gain and high-speed device applications.
Only a short abstract or summary was supplied by the source.
Source: crossref · Quality: short

Research context

OpenAlex topics: Ga2O3 and related materials · Thin-Film Transistor Technologies · Semiconductor materials and devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Innovation Center of Gallium Oxide Semiconductor (IC-GAO), College of Integrated Circuit Science and Engineering (College of Industry-Education Integration), Nanjing University of Posts and Telecommunications, Nanjing 210023, China

School of Electronic Information Engineering, Electronic-Photonic Smart Sensing Device R&D Team, Inner Mongolia Key Laboratory of Intelligent Communication and Sensing and Signal Processing, Inner Mongolia University, Hohhot 010021, China

Funding

National Natural Science Foundation of China · China Scholarship Council

References (46)

Show source-provided references
1. Zhang · Nat. Rev. Electr. Eng. · 2025 · 2 · 15510.1038/s44287-024-00135-5 ↗
2. Chaudhuri · Science · 2019 · 365 · 145410.1126/science.aau8623 ↗
3. Nemanich · MRS Bull. · 2014 · 39 · 49010.1557/mrs.2014.97 ↗
4. Tadjer · Science · 2022 · 378 · 72410.1126/science.add2713 ↗
5. Wu · IEEE Trans. Electron Devices · 2025 · 72 · 681410.1109/TED.2025.3616278 ↗
6. Zhou · Sci. Adv. · 2025 · 11 · eadw616710.1126/sciadv.adw6167 ↗
7. Chettri · J. Phys. D: Appl. Phys. · 2025 · 58 · 03510410.1088/1361-6463/ad8759 ↗
8. Pan · Phys. Rev. Appl. · 2025 · 24 · 06404310.1103/mnx1-t34v ↗
9. Fu · IEEE Trans. Electron Devices · 2025 · 72 · 14710.1109/TED.2024.3505847 ↗
10. Hiroki · IEEE Electron Device Lett. · 2022 · 43 · 35010.1109/LED.2022.3141100 ↗
11. Li · Nat. Rev. Mater. · 2023 · 8 · 58710.1038/s41578-023-00583-9 ↗
12. Zhang · IEEE Trans. Nucl. Sci. · 2024 · 1
13. Morteza Najarian · Nat. Rev. Phys. · 2024 · 6 · 21910.1038/s42254-024-00699-z ↗
14. Tang · J. Mater. Chem. C · 2025 · 13 · 1833810.1039/D5TC02250A ↗
15. Wei · J. Mater. Chem. C · 2025 · 13 · 1225410.1039/D5TC01300C ↗
16. Zhao · Adv. Funct. Mater. · 2017 · 27 · 170026410.1002/adfm.201700264 ↗
17. Wu · IEEE Electron Device Lett. · 2025 · 46 · 208610.1109/LED.2025.3605225 ↗
18. Tsai · Appl. Phys. Lett. · 2024 · 124 · 11210510.1063/5.0198160 ↗
19. Zhang · Phys. Rev. B · 2022 · 106 · 20530510.1103/PhysRevB.106.205305 ↗
20. Yao · Mater. Today Phys. · 2024 · 49 · 10160410.1016/j.mtphys.2024.101604 ↗
21. Li · Cryst. Growth Des. · 2025 · 25 · 140610.1021/acs.cgd.4c01472 ↗
22. Wakamatsu · J. Appl. Phys. · 2024 · 135 · 15570510.1063/5.0207432 ↗
23. Hung · IEEE Trans. Electron Devices · 2025 · 72 · 99610.1109/TED.2025.3527952 ↗
24. Kim · Nanomaterials · 2024 · 14 · 17810.3390/nano14020178 ↗
25. Yang · ACS Appl. Mater. Interfaces · 2022 · 14 · 559810.1021/acsami.1c21845 ↗
26. Wakamatsu · Jpn. J. Appl. Phys. · 2023 · 62 · SF102410.35848/1347-4065/acc9cf ↗
27. Tauc · Phys. Status Solidi B · 1966 · 15 · 62710.1002/pssb.19660150224 ↗
28. Yao · ACS Appl. Electron. Mater. · 2023 · 5 · 706110.1021/acsaelm.3c01371 ↗
29. Marezio · J. Chem. Phys. · 1967 · 46 · 186210.1063/1.1840945 ↗
30. Kang · ACS Omega · 2021 · 6 · 3129210.1021/acsomega.1c05130 ↗
31. Patterson · Phys. Rev. · 1939 · 56 · 97810.1103/PhysRev.56.978 ↗
32. Lipinska-Kalita · Phys. Rev. B: Condens. Matter Mater. Phys. · 2003 · 68 · 03520910.1103/PhysRevB.68.035209 ↗
33. S. M.Sze and K. K.Ng , Physics of semiconductor devices , Wiley-Interscience , Hoboken, NJ , 3rd edn, 2007
34. Pecunia · Nat. Photonics · 2025 · 19 · 117810.1038/s41566-025-01759-1 ↗
35. Yao · J. Semicond. · 2024 · 45 · 12240210.1088/1674-4926/24050048 ↗
36. Li · IEEE Sens. J. · 2025 · 25 · 251810.1109/JSEN.2024.3497006 ↗
37. Peng · IEEE Photonics Technol. Lett. · 2026 · 38 · 21910.1109/LPT.2025.3627605 ↗
38. Leger · J. Phys. Chem. Solids · 1996 · 57 · 110.1016/0022-3697(95)00060-7 ↗
39. Uno · Appl. Phys. Lett. · 2020 · 117 · 05210610.1063/5.0014056 ↗
40. Bechstedt · Appl. Phys. Lett. · 2019 · 114 · 12210110.1063/1.5084324 ↗
41. Mott · Rev. Mod. Phys. · 1968 · 40 · 67710.1103/RevModPhys.40.677 ↗
42. Feneberg · Appl. Phys. Lett. · 2019 · 114 · 14210210.1063/1.5086731 ↗
43. Zhang · APL Mater. · 2020 · 8 · 02090610.1063/1.5142999 ↗
44. Polyakov · APL Mater. · 2019 · 7 · 05110310.1063/1.5094787 ↗
45. Polyakov · J. Vac. Sci. Technol., A · 2022 · 40 · 02080410.1116/6.0001701 ↗
46. Traoré · Jpn. J. Appl. Phys. · 2022 · 61 · 09100210.35848/1347-4065/ac7f6e ↗