Achieving atomic-level surfaces for aluminum alloys induced by a novel chemical mechanical polishing strategy using a developed polisher with yttria hybrid nano-abrasives
Source abstract
Abstract
Schematic diagram of an atomic model for mechanism of chemical mechanical polishing at (a) original surface, (b) dissolution, (c) complexation and (d) removal stages.
Only a short abstract or summary was supplied by the source.
Source: crossref · Quality: short
Research context
OpenAlex topics: Advanced Surface Polishing Techniques · Force Microscopy Techniques and Applications · Nanofabrication and Lithography Techniques
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
State Key Laboratory of High-performance Precision Manufacturing, Dalian University of Technology, Dalian 116024, China
School of Energy and Power Engineering, Dalian University of Technology, Dalian 116024, China
Faculty of Medicine, Dalian Third People's Hospital Affiliated to Dalian University of Technology, Dalian 116024, China
Tianjin Institute of Aerospace Mechanical and Electrical Equipment, Tianjin 300301, China
Sarlboro Petrochemical (Tianjin) Co., Ltd, Tianjin 300300, China
Baotou Iron and Steel (Group) Co., Ltd, Baotou 014010, China
Baosteel Group Mine Research Institute (Co., Ltd), Baotou 014030, China
Sinosteel Maanshan General Institute of Mining Research Co., Ltd, Maanshan 243000, China
Funding
Fundamental Research Funds for the Central Universities · Science and Technology Commission of Shanghai Municipality
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