Unravelling the mechanism of phase fraction modulation via process parameter tuning and first-principles study for enhanced TCR in VO x -based uncooled microbolometers
Source abstract
Abstract
Changing the Ar/O 2 flow ratio at the gas inlet leads to an increase in TCR at low-temperature deposition in a sputtering chamber.
Only a short abstract or summary was supplied by the source.
Source: crossref · Quality: short
Research context
OpenAlex topics: Transition Metal Oxide Nanomaterials · Surface Roughness and Optical Measurements · Infrared Target Detection Methodologies
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Materials Science and Engineering, Indian Institute of Technology, Delhi, Hauz Khas, New Delhi 110016, India
Functional Nanomaterials Research Laboratory (FNRL), Department of Physics and Centre for Nanotechnology, Indian Institute of Technology Roorkee, Roorkee 247667, Uttarakhand, India
School of Interdisciplinary Research, Indian Institute of Technology, Delhi, Hauz Khas, New Delhi 110016, India
Solid State Physics Laboratory, DRDO, Lucknow Road, Timarpur, Delhi 110054, India
Department of Ceramic Engineering, Indian Institute of Technology (BHU), Varanasi 221005, Uttar Pradesh, India
Department of Chemistry, Indian Institute of Technology, Delhi, Hauz Khas, New Delhi 110016, India
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