Insights into the chemistry of vapor phase infiltration for imaging non-fullerene acceptors
Source abstract
Abstract
A chemical reaction during vapor phase infiltration (VPI) is harnessed to “stain” non-fullerene acceptors (NFAs) for imaging the morphology of organic electronic films.
Only a short abstract or summary was supplied by the source.
Source: crossref · Quality: short
Research context
OpenAlex topics: Organic Electronics and Photovoltaics · Force Microscopy Techniques and Applications · Semiconductor materials and devices
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Material Science and Engineering, Technion – Israel Institute of Technology, Haifa, 3200003, Israel
Schulich Faculty of Chemistry, Technion – Israel Institute of Technology, Haifa, 3200003, Israel
Funding
Technion-Israel Institute of Technology · United States - Israel Binational Science Foundation · Russell Berrie Nanotechnology Institute, Technion-Israel Institute of Technology · National Science Foundation
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