article·2014-01-01

原子層堆積法によるZnOナノ粒子修飾HfO 2 /Sn-ドープIn 2 O 3 コア-シェルナノワイア:電界放出挙動の表面修飾エンジニアリングによる増強

Wen-Chih Chang, Huang Chi-Hsin, Lai Chih-Chung, Tsai Hsu-Sheng, Lin Shih-Min, Lin Su-Jien, Chueh Yu-Lun

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OpenAlex topics: Military Technology and Strategies · Legal and Regulatory Analysis · Linguistic, Cultural, and Literary Studies

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