Control of self-propagating reactions and phases in Ni/Si reactive multilayers
Source abstract
Abstract
Selecting freestanding bilayer thickness of Ni/Si reactive multilayers below 50 nm or above 170 nm could better control the final phases for practical applications.
Only a short abstract or summary was supplied by the source.
Source: crossref · Quality: short
Research context
OpenAlex topics: Semiconductor materials and interfaces · Intermetallics and Advanced Alloy Properties · Microstructure and mechanical properties
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Materials Science and Engineering, National Taiwan University, Taipei, 10617, Taiwan
Department of Electrophysics, National Yang Ming Chiao Tung University, Hsinchu, 30010, Taiwan
Funding
National Science and Technology Council
References (51)
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