10 nm scale nanopatterning on flexible substrates by a secondary sputtering phenomenon and their applications in high performance, flexible and transparent conducting films

We present a simple nanopatterning method for flexible substrates with high resolution (approx. 15 nm) that uses the secondary sputtering phenomenon (SSP) and no solvents at room temperature, and characterize flexible and transparent conducting films that have performances comparable to that of ITO films yet higher mechanical stability.