journal article·2019Open access

Electrodeposition of nanometer-thick epitaxial films of silver onto single-crystal silicon wafers

Qingzhi Chen, Jay A. Switzer

Abstract

Silver films were deposited epitaxially for the first time onto low-index, single-crystal silicon wafers through an electrochemical method in an aqueous silver acetate bath.
Only a short abstract or summary was supplied by the source.
Source: crossref · Quality: short

Research context

OpenAlex topics: Nanowire Synthesis and Applications · Anodic Oxide Films and Nanostructures · Semiconductor materials and interfaces

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Missouri University of Science & Technology

Department of Chemistry and Graduate Center for Materials Research

Rolla

USA

Funding

Basic Energy Sciences

References (26)

Show source-provided references
1. Balsano · AIP Adv. · 2013 · 3 · 11211010.1063/1.4831756 ↗
2. Sun · Sci. Rep. · 2017 · 7 · 310.1038/s41598-017-00038-6 ↗
3. Lu · Science · 2012 · 337 · 45010.1126/science.1223504 ↗
4. Lu · Acta Mater. · 2014 · 79 · 24110.1016/j.actamat.2014.07.030 ↗
5. Wu · Adv. Mater. · 2014 · 26 · 610610.1002/adma.201401474 ↗
6. Lin · J. Am. Chem. Soc. · 1993 · 115 · 1164410.1021/ja00077a092 ↗
7. Grodzicki · Coord. Chem. Rev. · 2005 · 249 · 223210.1016/j.ccr.2005.05.026 ↗
8. Park · Metall. Mater. Trans. A · 1990 · 21A · 232310.1007/BF02646979 ↗
9. Mckenna · J. Electron. Mater. · 1991 · 20 · 110.1007/BF02665961 ↗
10. Hur · J. Appl. Phys. · 2008 · 103 · 110.1063/1.2924323 ↗
11. Hur · Phys. Rev. B: Condens. Matter Mater. Phys. · 2007 · 75 · 110.1103/PhysRevB.75.205306 ↗
12. Kong · J. Appl. Phys. · 2015 · 118 · 21310310.1063/1.4936620 ↗
13. Bhukta · Appl. Phys. A: Mater. Sci. Process. · 2016 · 122 · 110.1007/s00339-016-9929-6 ↗
14. Prod’Homme · Appl. Phys. Lett. · 2008 · 93 · 17190110.1063/1.3006064 ↗
15. Switzer · ACS Appl. Mater. Interfaces · 2016 · 8 · 1582810.1021/acsami.6b04552 ↗
16. Chen · ACS Appl. Mater. Interfaces · 2018 · 10 · 2136510.1021/acsami.8b06388 ↗
17. Hull · ACS Appl. Mater. Interfaces · 2018 · 10 · 3859610.1021/acsami.8b13188 ↗
18. Duan · J. Phys. Chem. C · 2017 · 121 · 724010.1021/acs.jpcc.6b12896 ↗
19. M. Schlesinger , Modern Electroplating , Wiley-Blackwell , 5th edn, 2011 , pp. 131–138
20. Leistner · J. Electrochem. Soc. · 2018 · 165 · H307610.1149/2.0071804jes ↗
21. Prodhomme · ChemPhysChem · 2010 · 11 · 299210.1002/cphc.201000236 ↗
22. Chen · Cryst. Growth Des. · 2013 · 13 · 207510.1021/cg400142g ↗
23. Chang · Appl. Phys. Lett. · 1990 · 57 · 223910.1063/1.103902 ↗
24. Munford · Surf. Sci. · 2003 · 537 · 9510.1016/S0039-6028(03)00563-6 ↗
25. Li · Surf. Sci. · 2002 · 520 · 710.1016/S0039-6028(02)02313-0 ↗
26. Abdul Wasey · Phys. Status Solidi B · 2013 · 250 · 131310.1002/pssb.201248542 ↗