Analysis of EUV induced depolymerization and side reactions of polyphthalaldehydes for dry develop EUV resist applications
Source abstract
Abstract
With the emergence of extreme ultraviolet (EUV) lithography, poly(phthalaldehyde) (PPA) has regained attention as a potential photoresist four decades after its initial introduction to the field of lithography in the 1980s.
Only a short abstract or summary was supplied by the source.
Source: crossref · Quality: short
Research context
OpenAlex topics: Advancements in Photolithography Techniques · Electron and X-Ray Spectroscopy Techniques · Copper Interconnects and Reliability
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Chemistry, KU Leuven, 3001 Leuven, Belgium
imec, Kapeldreef 75, 3001 Leuven, Belgium
School of Chemical and Biomolecular Engineering, Georgia Institute of Technology, Atlanta, GA, USA
Cain Department of Chemical Engineering, Louisiana State University, Baton Rouge, LA, USA
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