journal article·2021

Chlorine-mediated atomic layer deposition of HfO 2 on graphene

Peter M. Wilson, Matt L. Chin, Chinedu E. Ekuma, Sina Najmaei, Katherine M. Price, Theanne Schiros, Madan Dubey, James Hone

Journal of Materials Chemistry C· Volume 9· Issue 48
Publisher page

Abstract

The ALD process of deposition of ultrathin high- κ HfO 2 on chlorinate graphene.
Only a short abstract or summary was supplied by the source.
Source: crossref · Quality: short

Research context

OpenAlex topics: Semiconductor materials and devices · Graphene research and applications · Advanced Memory and Neural Computing

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Sensors and Electron Devices Directorate, United States Army Research Laboratory, Adelphi, MD, USA

Department of Physics, Lehigh University, Bethlehem, PA 18015, USA

Institute for Functional Materials and Devices, Lehigh University, Bethlehem, PA 18015, USA

Materials Science and Engineering Center, Columbia University, New York, NY 10023, USA

Department of Science and Mathematics, Fashion Institute of Technology, New York, NY 10001, USA

Department of Mechanical Engineering, Columbia University, New York, New York 10027, USA

Funding

National Science Foundation · Army Research Laboratory · Lehigh University

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