Photothermal chemical mechanical polishing: a synergistic mechanism for fast and atomic level surface perfection
Source abstract
Abstract
A photothermal chemical mechanical polishing (PTCMP) technique is developed with defect-engineered black nano-titanium dioxide (TiO 2 ) as the photothermal catalyst, achieving high material removal rate and atomic-level surface roughness.
Only a short abstract or summary was supplied by the source.
Source: crossref · Quality: short
Research context
OpenAlex topics: Advanced Surface Polishing Techniques · Laser Material Processing Techniques · Force Microscopy Techniques and Applications
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
State Key Laboratory of Silicon and Advanced Semiconductor Materials, School of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, China
Institute of Functional Nano & Soft Materials (FUNSOM) Jiangsu Key Laboratory of Advanced Negative Carbon Technologies, Soochow University, Suzhou 215123, China
Provincial Key Laboratory of High-Performance Silicon Material Equipment, Shangyu Institute of Semiconductor Materials, Shaoxing 312399, China
Institute of Advanced Semiconductors, Hangzhou Global Scientific and Technological Innovation Center, Hangzhou 311200, China
Zhejiang Provincial Key Laboratory of Optoelectronic Functional Materials and Devices, Hangzhou, 311200, China
Funding
China Postdoctoral Science Foundation · Natural Science Foundation of Zhejiang Province · National Key Research and Development Program of China
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