DataVXJournal of Materials Chemistry APaper
journal article·2015Open access

Correction: Plasma enhanced atomic layer deposition of Ga 2 O 3 thin films

Ranjith K. Ramachandran, Jolien Dendooven, Jonas Botterman, Sreeprasanth Pulinthanathu Sree, Dirk Poelman, Johan A. Martens, Hilde Poelman, Christophe Detavernier

Journal of Materials Chemistry A· Volume 3· Issue 2
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Source abstract

Abstract

Correction for ‘Plasma enhanced atomic layer deposition of Ga 2 O 3 thin films’ by Ranjith K. Ramachandran et al. , J. Mater. Chem. A , 2014, 2 , 19232–19238.
Only a short abstract or summary was supplied by the source.
Source: crossref · Quality: short

Research context

Materials processing

OpenAlex topics: Ga2O3 and related materials · ZnO doping and properties

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Solid State Sciences

CoCooN

Ghent University

9000 Ghent

Belgium

LumiLab

Centre for Surface Chemistry and Catalysis

Catholic University of Leuven

B-3001 Leuven

Laboratory for Chemical Technology

B-9052 Zwijnaarde

References

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