Temperature dependent FMR on CoCr-layers

journal article·1990-01Open access

E.M.C.M. Reuvekamp, A.M. de Witte, W.A.M. Aarnink, G.J. Gerritsma, J.C. Lodder, H. Rogalla

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Abstract

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OpenAlex topics: Acoustic Wave Resonator Technologies · Metal and Thin Film Mechanics · GaN-based semiconductor devices and materials

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Show source-provided references

1. Artman · J. Appl. Phys. · 1987 · 61 · 313710.1063/1.337819 ↗

2. Stam · 1989

3. Smit · Philips Res. Rep. · 1955 · 10 · 113

4. Hoshi · IEEE Trans. on Magn. · 1984 · MAG-20 · 79710.1109/TMAG.1984.1063360 ↗