journal article·2004-05

Electrical properties of the patterned Co/Cu/Co sub-micron dots using a probe contact

J. Hayakawa, M. Fujimori, S. Heike, M. Ishibashi, T. Hashizume, K. Ito, H. Ohno

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Abstract

Abstract Using conductive atomic force microscopy, we investigated the electrical properties of patterned Co/Cu/Co sub-micron dots which were aligned at 200 nm intervals. As a result, we observed the I – V character having hysteresis behavior; it was apparently due to a magnetization reversal caused by the spin transfer torque. We demonstrated that the probe technique was able to be one of the candidates of the future high-areal-density magnetic recording devices.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Magnetic properties of thin films · Copper Interconnects and Reliability · ZnO doping and properties

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References (6)

Show source-provided references
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