Spatial resolution measurement of giant magneto-resistance thin film
Source abstract
Abstract
Abstract A system to measure magneto-resistance curves of thin films in a magnetic field of 40 Oe p–p at 2 MHz was developed, using a low noise, sheet-type four-terminal electrode. High intensity magnetic field was produced by resonance of a ferrite core electromagnet with a capacitor connected in parallel. The small size electrode enables measurements of spatial MR ratio distribution of a thin film on a 75 mm∅ silicon wafer.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Magnetic Properties and Applications · Magnetic properties of thin films · Metallic Glasses and Amorphous Alloys
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References (6)
Show source-provided references
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