Ta and W additions to Co83Cr17 thin films deposited on Co79Cr21 underlayer
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Abstract
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Research context
OpenAlex topics: Copper Interconnects and Reliability · Metal and Thin Film Mechanics · Electrodeposition and Electroless Coatings
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References (2)
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1. Maeda · J. Appl. Phys. · 1987 · 61 · 197210.1063/1.337992 ↗
2. Matsuoka · J. Appl. Phys. · 1985 · 57 · 401910.1063/1.334664 ↗