Soft magnetic properties of as-deposited nanocrystalline Fe–Al–O thin films

Abstract The influence of O 2 partial pressure on saturation magnetization, coercivity and effective permeability were investigated on the as-deposited Fe–Al–O thin films, which were fabricated by RF magnetron reactive sputtering method. The nanocrystalline Fe 87.3 Al 4.2 O 8.5 thin film fabricated at O 2 partial pressure of 5% exhibited the best magnetic softness with a saturation magnetization of 19.6 kG, coercivity of 0.6 Oe, and effective permeability of about 2500 up to 100 MHz. The electrical resistivity of Fe 87.3 Al 4.2 O 8.5 was 55.4 μΩ cm.