Effects of the process parameters on the microstructure and magnetic properties of nanocrystalline FeTaCN films

Abstract FeTaCN films were prepared by DC-magnetron reactive co-sputtering of Fe target and TaC composite target with Ar+N 2 sputtering gas. Effects of annealing temperature and sputtering power density of the Fe target on the magnetic properties and microstructure of the FeTaCN film were investigated. Transmission electron microscopy analysis indicated that the FeTaCN film was nanocrystalline structure. The in-plane coercivity H c || is about 1 – 3 Oe and saturation magnetization 4 πM s is about 12 – 15 kG for the as-deposited film.