Scaling behavior of the anisotropy magnetic films: Experiment and simulation

Abstract Polycrystalline Co 50 Ni 50 and Ni films were deposited on Si substrate by magnetron sputtering. The hysteresis loops of those films with various ac magnetic field amplitude H 0 and frequency ω have been measured. The scaling behavior of the anisotropy magnetic film has been simulated with Monte Carlo method. The experimental and simulated results indicate that: (1) the scaling laws were all fitted with the applied field along and perpendicular to the plane of the film, while the scaling exponents for both cases are quite different; (2) the anisotropy of magnetic films influences clearly the scaling behavior. With increasing anisotropy constant K , the value of α increases and the magnitude of β decreases; (3) the annealing gives rise to the obvious change of the anisotropy and preferring orientation; (4) The simulated results are consistent with the experimental facts.