journal article·1990-11

Effects of Ru and Ti additions on soft magnetic properties in FeGaSi and FeAlSi sputtered films

K. Hayashi, M. Hayakawa, K. Aso

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Semiconductor materials and interfaces · Magnetic Properties and Applications · Metallic Glasses and Amorphous Alloys

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References (4)

Show source-provided references
1. Hayashi · J. Appl. Phys. · 1987 · 61 · 351410.1063/1.338712 ↗
2. Hayashi · J. Appl. Phys. · 1988 · 64 · 77210.1063/1.341923 ↗
3. PEG3130C, HOYA Corp., Tokyo, Japan.
4. Takahashi · J. Magn. Magn. Mat. · 1987 · 66 · 5510.1016/0304-8853(87)90128-4 ↗