Patterning of sub-micrometric Co/NiO dots by hot embossing lithography and study of their magnetic properties

Abstract Ferromagnetic/antiferromagnetic Co/NiO films were patterned into sub-micrometric dots by hot embossing lithography. The magneto-optical Kerr effect study of these dots shows that when the dot size decreases, the coercive field H c increases and the exchange bias field H EB decreases.