Microstructural evolution in PtMn-based spin-valves induced by heat treatment
Source abstract
Abstract
Abstract Annealing time effect on the magnetotransport properties was investigated for Si/alumina/Ta/NiFe/CoFe/Cu/CoFe/PtMn/Ta samples having different PtMn thickness (10–30 nm). Post-deposition heat treatment was performed using a vacuum furnace with 3 kOe field at 270°C up to 35 h. The thermally activated atoms diffused to other layers through grain boundaries during the heat treatment with longer annealing hours resulting in deteriorating Δ R / R . This effect is more profound in films with thicker PtMn layers where interface became rougher after annealing.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Copper Interconnects and Reliability · Semiconductor materials and devices · Magnetic properties of thin films
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References (5)
Show source-provided references
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