Anisotropy in metallic thin films patterned by the atomic saw method

H Jaffrès; L Ressier; F Michelini; D Chandesris; P Le Fèvre; H Magnan; J.L Gauffier; R Mamy; M Goiran; J.P Peyrade; J.F Bobo; J.C Ousset; J.P Redoulès; D Bertrand; A.R Fert

doi:10.1016/s0304-8853(99)00212-7

journal article·1999-08

Anisotropy in metallic thin films patterned by the atomic saw method

H Jaffrès, L Ressier, F Michelini, D Chandesris, P Le Fèvre, H Magnan, J.L Gauffier, R Mamy, M Goiran, J.P Peyrade, J.F Bobo, J.C Ousset, J.P Redoulès, D Bertrand, A.R Fert

Journal of Magnetism and Magnetic Materials· Volume 203· Issue 1-3

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OpenAlex topics: Magnetic properties of thin films · Magnetic Properties and Applications · Characterization and Applications of Magnetic Nanoparticles

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References (4)

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1. H. Jaffrès, L. Ressier, J.P. Peyrade, A.R. Fert, P. Gogol, A. Thiaville, A. Schuhl, F. Nguyen Van Dau, J. Appl. Phys., submitted for publication.

2. Jaffrès · J. Magn. Magn. Mater. · 1998 · 184 · 1910.1016/S0304-8853(97)01103-7 ↗

3. Ressier · J. Appl. Phys. · 1997 · 81 · 546410.1063/1.364626 ↗

4. Jiang · Phys. Rev. B · 1991 · 44 · 640110.1103/PhysRevB.44.6401 ↗