journal article·2004-01

Magnetic distribution of the free layer on patterned MTJ multilayers

CheolGi Kim, Chong-Oh Kim, Tae-Sik Yoon, Masakiyo Tsunoda, Migaku Takahashi

Publisher page

Abstract

Abstract Local M–H loops have been measured on the free layer of a magnetic tunnel junction multilayers using the magneto-optical Kerr effect system, with 2 μm spatial resolution. The relatively irregular variations of coercivity HC (∼17.5 Oe) and exchange coupling field HE (∼7.5 Oe) are revealed in as-deposited sample prepared by the DC magnetron sputtering. After 200°C annealing, HC decreases to 15 Oe, while HE increases to 20 Oe with smooth local variation. Two-dimensional plots of HC and HE show the symmetric saddle shapes with their axes aligned with the pinned layer, where both HC and HE variations along free-layer axis are larger than those along pinned-layer axis. The increasing slope per micrometer of normalized HC and HE are the same near the junction edge along free-layer direction irrespective of junction size, giving the relatively uniform HC and HE for wider junction size.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Magnetic properties of thin films · Physics of Superconductivity and Magnetism · ZnO doping and properties

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (14)

Show source-provided references
1. Parkin · J. Appl. Phys. · 1999 · 85 · 582810.1063/1.369932 ↗
2. Moodera · Phys. Rev. Lett. · 1995 · 74 · 327310.1103/PhysRevLett.74.3273 ↗
3. Julliere · Phys. Lett. · 1975 · 54A · 22510.1016/0375-9601(75)90174-7 ↗
4. Slonczewski · Phys. Rev. B. · 1989 · 39 · 699510.1103/PhysRevB.39.6995 ↗
5. Moodera · Appl. Phys. Lett. · 1996 · 69 · 70810.1063/1.117814 ↗
6. Pust · J. Appl. Phys. · 1999 · 85 · 576510.1063/1.370119 ↗
7. Ruderman · Phys. Rev. · 1954 · 96 · 9910.1103/PhysRev.96.99 ↗
8. Neel · C. R. Acad. Sci. · 1962 · 255 · 1676
9. Chopra · Phys. Rev. B. · 2000 · 61 · 964210.1103/PhysRevB.61.9642 ↗
10. Lee · J. Appl. Phys. · 2002 · 91 · 711310.1063/1.1451598 ↗
11. Tsunoda · Appl. Phys. Lett. · 2002 · 80 · 313510.1063/1.1475363 ↗
12. Kim · J. Magn. · 2002 · 7 · 7210.4283/JMAG.2002.7.3.072 ↗
13. Tsunoda · J. Appl. Phys. · 2000 · 87 · 641510.1063/1.372723 ↗
14. J.E. Mahan, Physical Vapor Deposition of Thin Films, Wiley-Interscience Publication, New York, 2000 (Chapter VII.5)