journal article·1999-06

Plasma etching of NiFe/Cu and NiMnSb/Al2O3 multilayers for sub-micron pattern definition

K.B Jung, J Hong, J.R Childress, S.J Pearton, F Sharifi, M Jenson, A.T Hurst

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Abstract

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Research context

OpenAlex topics: Magnetic properties of thin films · Semiconductor materials and devices · Semiconductor materials and interfaces

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References (6)

Show source-provided references
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5. Kinoshita · IEEE Trans. Magn. · 1991 · 27 · 488810.1109/20.278980 ↗
6. Hong · J. Vac. Sci. Technol. A · 1998 · 16 · 215310.1116/1.581323 ↗