journal article·1999-03

Perpendicular Co–Cr thin films using a new sputtering plasma generating apparatus

S. Kadokura, Masahiko Naoe

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Magnetic properties of thin films · Metal and Thin Film Mechanics · Copper Interconnects and Reliability

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (7)

Show source-provided references
1. Chou · Proc. IEEE · 1997 · 85 · 65210.1109/5.573754 ↗
2. Maeda · IEEE Trans. Magn. · 1988 · 24 · 301210.1109/20.92318 ↗
3. Snyder · J. Appl. Phys. · 1993 · 73 · 555110.1063/1.353647 ↗
4. Kadokura · IEEE Trans. Magn. · 1996 · 32 · 381610.1109/20.539182 ↗
5. Maeda · IEEE Trans Magn. · 1997 · 33 · 87910.1109/20.560125 ↗
6. S. Kadokura, M. Naoe. IEEE Trans Magn. 34 (1998), to be published.10.1109/20.706642 ↗
7. P. Haasen, Physikalische metallkunde (translated in Japanese) Publishing Inc. Tokyo, 1981, p. 177.