High-performance small-track-width metal-in-gap heads made by reactive-ion etching

journal article·1990-01

C.W.M.P. Sillen, J.J.M. Ruigrok, M.G.J. Vepřek-Heijman, A.J.G. Bode-Fassbender, J.B. Giesbers

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OpenAlex topics: Semiconductor materials and devices · Integrated Circuits and Semiconductor Failure Analysis · Ion-surface interactions and analysis

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1. Ruigrok · J. Magn. Magn. Mat. · 1990 · 83 · 4110.1016/0304-8853(90)90425-P ↗

2. Heijman · Plasma Chem. Plasma Process · 1988 · 8 · 38310.1007/BF01016056 ↗

3. Sillen · IEEE Trans. Magn. · 1988 · MAG-24 · 180210.1109/20.11607 ↗

4. Ruigrok · IEEE Trans. Magn. · 1984 · MAG-20 · 87510.1109/TMAG.1984.1063327 ↗

5. Kobayashi · IEEE Trans. Magn. · 1985 · MAG-21 · 153610.1109/TMAG.1985.1064053 ↗

6. Ruigrok · 1990