journal article·1995-02

Structuring magnetic thin films by means of plasma etching

F.C.M.J.M. van Delft

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Advanced Surface Polishing Techniques · Copper Interconnects and Reliability · Semiconductor materials and devices

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References (9)

Show source-provided references
1. Chapman · 1980
2. Dry Etching for VLSI
3. Zieren · IEEE Trans. Magn. · 1993 · 29 · 306410.1109/20.281117 ↗
4. Dirne · J. of Appl. Phys. · 1989 · 66 · 74810.1063/1.343550 ↗
5. van Delft · 1992
6. van Delft · J. of Nucl. Mater. · 1993 · 200 · 36610.1016/0022-3115(93)90310-U ↗
7. van Delft · 1993 · Vol. 3 · 891
8. Kinoshita · IEEE Trans. Magn. · 1991 · 27 · 488810.1109/20.278980 ↗
9. van Delft · J. Mater. Sci. Lett. · 1994 · 13 · 137110.1007/BF00624499 ↗