Electron scattering characteristics of polycrystalline metal transition films by in-situ electrical resistance measurements
Source abstract
Abstract
In-situ electrical resistance measurements were performed to obtain the scattering characteristics of very thin polycrystalline metal transition magnetic alloys grown by ion beam deposition (IBD) on specific underlayers. The experimental curves show size effects at small film thicknesses and important differences between Co85Fe15 and Ni81Fe19 thin layers grown on identical underlayers of Ta70 Å/Ru13 Å. The largest difference was observed in Ni81Fe19 films grown on underlayers of amorphous Ta70 Å. The experimental curves of electrical resistivity/conductivity variation with layer thickness were well fit within the Mayadas and Shatzkes (M-S) model, assuming specific formulations for grain growth with layer thickness. © 2009 Elsevier B.V. All rights reserved.
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Research context
OpenAlex topics: Copper Interconnects and Reliability · Semiconductor materials and devices · Magnetic properties of thin films
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References (12)
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