Systematic study of surface magnetism in Si(111)–Fe system grown by solid phase epitaxy: In situ schematic magnetic phase diagram of Si(111)–Fe
Source abstract
Abstract
Abstract We have studied in situ structures and magnetic properties for several iron silicides grown on Si(111)7×7 clean surfaces by the solid phase epitaxy (SPE) method: deposition of Fe at 40 K and subsequently annealing, and summarized almost all silicide phases depending on the deposition thickness and the annealing temperature as a “schematic magnetic phase diagram”. In the SPE growth, bcc-Fe(111)1×1, c-FeSi(111)1×1, 2×2, and c(4×8), α-FeSi2(112)2×2, ϵ-FeSi(111)√3 × √ 3-R30°, β-FeSi2(101)/(110) and polycrystalline phases are formed on Si(111)7×7 surfaces depending on Fe coverage (0.15–10.0 nm) and annealing temperature (470–1070 K). The structures and magnetic properties of all the above Fe silicide phases have been characterized by using in situ reflection high-energy electron diffraction, scanning tunneling microscopy, and surface magneto-optical Kerr effect. Bulk-unstable c-FeSi phases showed ferromagnetic property at 40 K and this ferromagnetism remained even after air exposure. For the c-FeSi(111)/Si(111) system, the large spin polarization was proposed at the Fe interface atoms in the B5-type interface structure between the c-FeSi(111) ultra-thin film and the Si(111) substrate by first-principle calculations.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Semiconductor materials and interfaces · Surface and Thin Film Phenomena · Magnetic properties of thin films
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (44)
Show source-provided references
1. Karaharazuka · Appl. Phys. Lett. · 2003 · 85 · L349210.1063/1.1807014 ↗
2. Liang · Appl. Phys. Lett. · 2006 · 88 · 11311110.1063/1.2185610 ↗
3. Men׳shov · Phys. Rev. B · 2011 · 83 · 03520110.1103/PhysRevB.83.035201 ↗
4. Lee · J. Magn. Magn. Mater. · 2004 · 272–276 · 118610.1016/j.jmmm.2003.12.1335 ↗
5. Wu · Phys. Rev. B · 2005 · 72
6. Robles · Surf. Sci. · 2001 · 482–485 · 99410.1016/S0039-6028(00)01078-5 ↗
7. Guo · Physica E · 2001 · 10 · 38310.1016/S1386-9477(01)00121-7 ↗
8. Yamada · J. Phys.: Condens. Matter · 1999 · 11 · L309
9. Christensen · Phys. Rev. B · 1990 · 42 · 714810.1103/PhysRevB.42.7148 ↗
10. Leong · Nature · 1997 · 387 · 68610.1038/42667 ↗
11. Hattori · Appl. Phys. Lett. · 2007 · 91 · 20191610.1063/1.2804006 ↗
12. Hattori · J. Phys.: Conf. Ser. · 2007 · 61 · 404
13. Kataoka · Phys. Rev. B · 2006 · 74 · 15540610.1103/PhysRevB.74.155406 ↗
14. Kubaschewski · 1982
15. Walter · J. Phys.: Condens. Matter · 2003 · 15 · 5207
16. Krause · Phys. Rev. B · 2003 · 68 · 12530610.1103/PhysRevB.68.125306 ↗
17. Starke · J. Appl. Phys. · 2002 · 91 · 615410.1063/1.1467397 ↗
18. Walter · Phys. Rev. B · 2003 · 67 · 08541310.1103/PhysRevB.67.085413 ↗
19. Berling · J. Magn. Magn. Mater. · 1999 · 191 · 33810.1016/S0304-8853(98)00369-2 ↗
20. Nazir · J. Magn. Magn. Mater. · 1996 · 156 · 43510.1016/0304-8853(95)00930-2 ↗
21. Takagi · Surf. Sci. · 2002 · 514 · 16710.1016/S0039-6028(02)01624-2 ↗
22. Kläsges · Phys. Rev. B · 1997 · 56 · 1080110.1103/PhysRevB.56.10801 ↗
23. Abe · Phys. Rev. B · 2008 · 77 · 05440910.1103/PhysRevB.77.054409 ↗
24. Qui · J. Magn. Magn. Mater. · 1999 · 200 · 66410.1016/S0304-8853(99)00311-X ↗
25. We confirmed the structure and magnetism have not depended on the Si(111)-7×7 surface temperatures during deposition: at either 40K or 300K, when the growth condition of ΘFe and Ta was the same.
26. Morikawa · Phys. Rev. B · 2001 · 63 · 03340510.1103/PhysRevB.63.033405 ↗
27. Garreau · Phys. Rev. B · 2005 · 71 · 19330810.1103/PhysRevB.71.193308 ↗
28. Raunau · Surf. Sci. · 1993 · 286 · 20310.1016/0039-6028(93)90406-A ↗
29. Wallart · Phys. Rev. B · 1994 · 49 · 571310.1103/PhysRevB.49.5714 ↗
30. Gavriljuk · Surf. Sci. Lett. · 1991 · 259 · L589
31. Chevrier · Appl. Surf. Sci. · 1992 · 56–58 · R13807
32. Hattori · Vacuum · 2010 · 84 · 64810.1016/j.vacuum.2009.06.031 ↗
33. A unity monolayer: ML is defined as 0.092nm which corresponds to the surface atomic density of an unreconstructed Si(111) phase: 7.83×1014 atoms/cm2. Thus, the thickness of Fe(111)1×1 at ΘFe=0.4nm represents ΘfilmFe=0.4/0.092=4.3ML. In the case of the c-FeSi(111), consisting of Fe and SI layers, since 1ML of Fe(111) deposition corresponds to 2 layers of c-FeSi(111), the thickness of Fe(111)1x1 at ΘFe=0.4nm represents ΘfilmFeSi=0.4/0.092×2=8.7ML.
34. Buschow · 1993 · vol. 7
35. Matsubara · J. Phys. Soc. Jpn. · 2003 · 72 · 132610.1143/JPSJ.72.1326 ↗
36. Chang · J. Appl. Phys. · 1992 · 72 · 59610.1063/1.351838 ↗
37. The ratio of √3×√3/2×2 was estimated from RHEED spots intensities: the average of four peaks (1/3, 1¯/3), (2/3, 1¯/3), (1¯/3, 1¯/3) and (2¯/3, 1¯/3)) and two peaks ((1/2, 1¯/2) and (1¯/2, 1¯/2)) intensities for √3×√3 and 2×2, respectively. The electron incidence was in [12¯1]Si at a glancing angle of 1.6°.
38. Moroni · Phys. Rev. B · 1999 · 59 · 1286010.1103/PhysRevB.59.12860 ↗
39. Bean · J. Appl. Phys. · 1959 · 30 · S12010.1063/1.2185850 ↗
40. Skumryev · Nature · 2003 · 423 · 43710.1038/nature01687 ↗
41. Eisenmenger · Nat. Mater. · 2003 · 2 · 43710.1038/nmat934 ↗
42. Park · Phys. Rev. B · 1995 · 52 · 1277910.1103/PhysRevB.52.12779 ↗
43. Shirasawa · e-J. Surf. Sci. Nanotech. · 2009 · 7 · 51310.1380/ejssnt.2009.513 ↗
44. Hattori · Thin Solid Films · 2004 · 464–465