Control of the magnetic domain wall propagation in Pt/Co/Pt ultra thin films using direct mechanical AFM lithography

We create mesoscopic point and line defects by scanning probe lithography to control the magnetization reversal process in Pt/Co/Pt ultra thin film devices. The domain wall propagation near the defects is studied by the Kerr microscopy and extraordinary Hall effect measurements. The observed domain wall pinning is used to block and channel the domain expansion and to create artificial domain patterns.