Thickness dependence of magnetic properties and giant magneto-impedance effect in amorphous Co73Si12B15 thin films prepared by Dual-Ion beam assisted deposition
Source abstract
Abstract
Abstract Dual-Ion Beam Assisted Deposition is a suitable method for the preparation of giant magneto-impedance (GMI) materials. In this paper, Co 73 Si 12 B 15 thin films with different thicknesses were prepared by Dual-Ion Beam Assisted Deposition, and the influences of film thickness on magnetic properties and GMI effect were investigated. It was found that the asymmetric magnetic hysteresis loop in the prepared Co 73 Si 12 B 15 thin films occurs at ambient temperature, and the shift behavior of hysteresis loop associated with film thickness. With the film thickness increasing, the values of shift field and coercive field and other parameters such as remanence and shift ratio appeared complex variation. At a certain frequency, the large GMI effect is only observed in some films, which have good magnetic properties including low coercivity, low remanence ratio and high shift ratio. The results indicated that the thickness dependence of magnetic properties nonlinearly determined the GMI effect in Co 73 Si 12 B 15 thin films.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Metallic Glasses and Amorphous Alloys · Surface Roughness and Optical Measurements · Magnetic properties of thin films
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (30)
Show source-provided references
1. Xiao · Phys. Rev. B · 2000 · 61 · 573410.1103/PhysRevB.61.5734 ↗
2. Mohri · IEEE Trans. Magn. · 1992 · 28 · 315010.1109/20.179741 ↗
3. Jantaratana · IEEE Trans. Magn. · 2006 · 42 · 35810.1109/TMAG.2005.863270 ↗
4. Byon · J. Appl. Phys. · 2001 · 89 · 7220
5. Kurlyandskaya · 2002 · 242–245 · 291
6. de Cos · J. Magn. Magn. Mater. · 2008 · 320 · e95410.1016/j.jmmm.2008.04.174 ↗
7. Kurlyandskaya · J. Magn. Magn. Mater. · 2015 · 383 · 22010.1016/j.jmmm.2014.10.129 ↗
8. Corrêa · J. Magn. Magn. Mater. · 2008 · 320 · e2510.1016/j.jmmm.2008.02.116 ↗
9. Barandiarán · IEEE Trans. Magn. · 2002 · 38 · 305110.1109/TMAG.2002.802436 ↗
10. Sommer · J. Appl. Phys. · 1999 · 86 · 105710.1063/1.370847 ↗
11. Morikawa · IEEE Trans. Magn. · 1996 · 32 · 496510.1109/20.539303 ↗
12. Morikawa · IEEE Trans. Magn. · 1997 · 33 · 436710.1109/20.620448 ↗
13. Phan · Prog. Mater. Sci. · 2008 · 53 · 32310.1016/j.pmatsci.2007.05.003 ↗
14. Meng · Mater. Lett. · 2016 · 164 · 29110.1016/j.matlet.2015.10.037 ↗
15. Panina · IEEE Trans. Magn. · 1995 · 31 · 124910.1109/20.364815 ↗
16. Tuana · J. Magn. Magn. Mater. · 2006 · 304 · e5310.1016/j.jmmm.2006.01.174 ↗
17. Amaresh Chandra Mishra · J. Alloy. Compd. · 2009 · 480 · 77110.1016/j.jallcom.2009.02.054 ↗
18. Knobel · J. Appl. Phys. · 1996 · 79 · 164610.1063/1.361009 ↗
19. Beach · Appl. Phys. Lett. · 1994 · 64 · 365210.1063/1.111170 ↗
20. Hu · J. Appl. Phys. · 2002 · 91 · 741810.1063/1.1448303 ↗
21. Amalou · J. Appl. Phys. · 2001 · 90 · 346610.1063/1.1398072 ↗
22. Makhnovskiy · Sens. Acta A · 2000 · 81 · 9110.1016/S0924-4247(99)00093-X ↗
23. Usov · J. Magn. Magn. Mater. · 1997 · 171 · 6410.1016/S0304-8853(97)00033-4 ↗
24. Atalay · J. Alloy. Compd. · 2005 · 392 · 32210.1016/j.jallcom.2004.09.024 ↗
25. Mandal · Phys. Rev. B · 2002 · 65 · 06440210.1103/PhysRevB.65.064402 ↗
26. Jantaratana · IEEE Trans. Magn. · 2006 · 42 · 35810.1109/TMAG.2005.863270 ↗
27. Zhang · J. Appl. Phys. · 2011 · 110 · 08391910.1063/1.3650244 ↗
28. Usov · J. Magn. Magn. Mater. · 1997 · 171 · 6410.1016/S0304-8853(97)00033-4 ↗
29. Cohen · Nature · 1961 · 189 · 13110.1038/189131b0 ↗
30. Kraus · J. Magn. Magn. Mater. · 2005 · 290–291 · 113110.1016/j.jmmm.2004.11.474 ↗